Liu, Y.; Lu, Z.; Wang, J.; Lai, J.; Li, Z.; Zhang, C.; Qi, Y.
Nano-CeO2 for the Photocatalytic Degradation of the Complexing Agent Citric Acid in Cu Chemical Mechanical Polishing. Appl. Sci. 2024, 14, 8285.
https://doi.org/10.3390/app14188285
AMA Style
Liu Y, Lu Z, Wang J, Lai J, Li Z, Zhang C, Qi Y.
Nano-CeO2 for the Photocatalytic Degradation of the Complexing Agent Citric Acid in Cu Chemical Mechanical Polishing. Applied Sciences. 2024; 14(18):8285.
https://doi.org/10.3390/app14188285
Chicago/Turabian Style
Liu, Yihang, Zongmao Lu, Jiajie Wang, Jinghui Lai, Ziyang Li, Chu Zhang, and Yuhang Qi.
2024. "Nano-CeO2 for the Photocatalytic Degradation of the Complexing Agent Citric Acid in Cu Chemical Mechanical Polishing" Applied Sciences 14, no. 18: 8285.
https://doi.org/10.3390/app14188285
APA Style
Liu, Y., Lu, Z., Wang, J., Lai, J., Li, Z., Zhang, C., & Qi, Y.
(2024). Nano-CeO2 for the Photocatalytic Degradation of the Complexing Agent Citric Acid in Cu Chemical Mechanical Polishing. Applied Sciences, 14(18), 8285.
https://doi.org/10.3390/app14188285
