Kim, S.; In, J.-H.; Kim, S.H.; Han, K.; Lim, D.; Hwang, Y.S.; Lee, K.M.; Choi, J.H.
Study of High Transmittance of SiO2/Nb2O5 Multilayer Thin Films Deposited by Plasma-Assisted Reactive Magnetron Sputtering. Appl. Sci. 2023, 13, 13271.
https://doi.org/10.3390/app132413271
AMA Style
Kim S, In J-H, Kim SH, Han K, Lim D, Hwang YS, Lee KM, Choi JH.
Study of High Transmittance of SiO2/Nb2O5 Multilayer Thin Films Deposited by Plasma-Assisted Reactive Magnetron Sputtering. Applied Sciences. 2023; 13(24):13271.
https://doi.org/10.3390/app132413271
Chicago/Turabian Style
Kim, Soyoung, Jung-Hwan In, Seon Hoon Kim, Karam Han, Dongkook Lim, Yun Sik Hwang, Kyung Min Lee, and Ju Hyeon Choi.
2023. "Study of High Transmittance of SiO2/Nb2O5 Multilayer Thin Films Deposited by Plasma-Assisted Reactive Magnetron Sputtering" Applied Sciences 13, no. 24: 13271.
https://doi.org/10.3390/app132413271
APA Style
Kim, S., In, J.-H., Kim, S. H., Han, K., Lim, D., Hwang, Y. S., Lee, K. M., & Choi, J. H.
(2023). Study of High Transmittance of SiO2/Nb2O5 Multilayer Thin Films Deposited by Plasma-Assisted Reactive Magnetron Sputtering. Applied Sciences, 13(24), 13271.
https://doi.org/10.3390/app132413271
