Fujii, T.; Hiraki, T.; Aihara, T.; Nishi, H.; Takeda, K.; Sato, T.; Kakitsuka, T.; Tsuchizawa, T.; Matsuo, S.
Development of an Epitaxial Growth Technique Using III-V on a Si Platform for Heterogeneous Integration of Membrane Photonic Devices on Si. Appl. Sci. 2021, 11, 1801.
https://doi.org/10.3390/app11041801
AMA Style
Fujii T, Hiraki T, Aihara T, Nishi H, Takeda K, Sato T, Kakitsuka T, Tsuchizawa T, Matsuo S.
Development of an Epitaxial Growth Technique Using III-V on a Si Platform for Heterogeneous Integration of Membrane Photonic Devices on Si. Applied Sciences. 2021; 11(4):1801.
https://doi.org/10.3390/app11041801
Chicago/Turabian Style
Fujii, Takuro, Tatsurou Hiraki, Takuma Aihara, Hidetaka Nishi, Koji Takeda, Tomonari Sato, Takaaki Kakitsuka, Tai Tsuchizawa, and Shinji Matsuo.
2021. "Development of an Epitaxial Growth Technique Using III-V on a Si Platform for Heterogeneous Integration of Membrane Photonic Devices on Si" Applied Sciences 11, no. 4: 1801.
https://doi.org/10.3390/app11041801
APA Style
Fujii, T., Hiraki, T., Aihara, T., Nishi, H., Takeda, K., Sato, T., Kakitsuka, T., Tsuchizawa, T., & Matsuo, S.
(2021). Development of an Epitaxial Growth Technique Using III-V on a Si Platform for Heterogeneous Integration of Membrane Photonic Devices on Si. Applied Sciences, 11(4), 1801.
https://doi.org/10.3390/app11041801