Article Versions Notes

Yang J-Y, Jung S, Byeon E-Y, Lee HH, Kim D-G, Kim HJ, Jang HW, Lee S. Preliminary Validation of a Continuum Model for Dimple Patterns on Polyethylene Naphthalate via Ar Ion Beam Sputtering. Polymers. 2021; 13(12):1932. https://doi.org/10.3390/polym13121932

Yang, Jun-Yeong, Sunghoon Jung, Eun-Yeon Byeon, Hyun Hwi Lee, Do-Geun Kim, Hyo Jung Kim, Ho Won Jang, and Seunghun Lee. 2021. "Preliminary Validation of a Continuum Model for Dimple Patterns on Polyethylene Naphthalate via Ar Ion Beam Sputtering" Polymers 13, no. 12: 1932. https://doi.org/10.3390/polym13121932

Yang, J.-Y., Jung, S., Byeon, E.-Y., Lee, H. H., Kim, D.-G., Kim, H. J., Jang, H. W., & Lee, S. (2021). Preliminary Validation of a Continuum Model for Dimple Patterns on Polyethylene Naphthalate via Ar Ion Beam Sputtering. Polymers, 13(12), 1932. https://doi.org/10.3390/polym13121932