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Journal: Crystals, 2024
Volume: 14
Number: 377

Article: Numerical Analysis of a High-Pressure Spatial Chemical Vapor Deposition (HPS-CVD) Reactor for Flow Stability at High Pressures
Authors: by Hooman Enayati and Siddha Pimputkar
Link: https://www.mdpi.com/2073-4352/14/4/377

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