Kalam, K.; Aan, M.-E.; Merisalu, J.; Otsus, M.; Ritslaid, P.; Kukli, K.
Threshold Switching and Resistive Switching in SnO2-HfO2 Laminated Ultrathin Films. Crystals 2024, 14, 909.
https://doi.org/10.3390/cryst14100909
AMA Style
Kalam K, Aan M-E, Merisalu J, Otsus M, Ritslaid P, Kukli K.
Threshold Switching and Resistive Switching in SnO2-HfO2 Laminated Ultrathin Films. Crystals. 2024; 14(10):909.
https://doi.org/10.3390/cryst14100909
Chicago/Turabian Style
Kalam, Kristjan, Mark-Erik Aan, Joonas Merisalu, Markus Otsus, Peeter Ritslaid, and Kaupo Kukli.
2024. "Threshold Switching and Resistive Switching in SnO2-HfO2 Laminated Ultrathin Films" Crystals 14, no. 10: 909.
https://doi.org/10.3390/cryst14100909
APA Style
Kalam, K., Aan, M.-E., Merisalu, J., Otsus, M., Ritslaid, P., & Kukli, K.
(2024). Threshold Switching and Resistive Switching in SnO2-HfO2 Laminated Ultrathin Films. Crystals, 14(10), 909.
https://doi.org/10.3390/cryst14100909