Article Versions Notes

Sucheewa N, Wongwiriyapan W, Klamchuen A, Obata M, Fujishige M, Takeuchi K, Lertvanithphol T, Wutikhun T, Kullyakool S, Auttasiri W, et al. Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates. Crystals. 2022; 12(1):78. https://doi.org/10.3390/cryst12010078

Sucheewa, Nguentra, Winadda Wongwiriyapan, Annop Klamchuen, Michiko Obata, Masatsugu Fujishige, Kenji Takeuchi, Tossaporn Lertvanithphol, Tuksadon Wutikhun, Saifon Kullyakool, Wanwalee Auttasiri, and et al. 2022. "Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates" Crystals 12, no. 1: 78. https://doi.org/10.3390/cryst12010078

Sucheewa, N., Wongwiriyapan, W., Klamchuen, A., Obata, M., Fujishige, M., Takeuchi, K., Lertvanithphol, T., Wutikhun, T., Kullyakool, S., Auttasiri, W., Sowasod, N., Prataen, T., Tanthapanichakoon, W., & Nukeaw, J. (2022). Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates. Crystals, 12(1), 78. https://doi.org/10.3390/cryst12010078