Um, D.-S.; Jin, M.-J.; Woo, J.-C.; Kim, D.-P.; Park, J.; Jo, Y.; Kim, G.-H.
Electrical Properties and Thermal Annealing Effects of Polycrystalline MoS2-MoSX Nanowalls Grown by Sputtering Deposition Method. Crystals 2021, 11, 351.
https://doi.org/10.3390/cryst11040351
AMA Style
Um D-S, Jin M-J, Woo J-C, Kim D-P, Park J, Jo Y, Kim G-H.
Electrical Properties and Thermal Annealing Effects of Polycrystalline MoS2-MoSX Nanowalls Grown by Sputtering Deposition Method. Crystals. 2021; 11(4):351.
https://doi.org/10.3390/cryst11040351
Chicago/Turabian Style
Um, Doo-Seung, Mi-Jin Jin, Jong-Chang Woo, Dong-Pyo Kim, Jungmin Park, Younghun Jo, and Gwan-Ha Kim.
2021. "Electrical Properties and Thermal Annealing Effects of Polycrystalline MoS2-MoSX Nanowalls Grown by Sputtering Deposition Method" Crystals 11, no. 4: 351.
https://doi.org/10.3390/cryst11040351
APA Style
Um, D.-S., Jin, M.-J., Woo, J.-C., Kim, D.-P., Park, J., Jo, Y., & Kim, G.-H.
(2021). Electrical Properties and Thermal Annealing Effects of Polycrystalline MoS2-MoSX Nanowalls Grown by Sputtering Deposition Method. Crystals, 11(4), 351.
https://doi.org/10.3390/cryst11040351