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Journal: Micromachines, 2023
Volume: 14
Number: 665
665
Article: Effect of Mask Geometry Variation on Plasma Etching Profiles
Authors: by Josip Bobinac, Tobias Reiter, Julius Piso, Xaver Klemenschits, Oskar Baumgartner, Zlatan Stanojevic, Georg Strof, Markus Karner and Lado Filipovic
Link: https://www.mdpi.com/2072-666X/14/3/665

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