Tang, Z.; Lv, Y.; Ang, K.; Wang, B.; Jiang, X.; Wang, Y.; Xu, J.; Meng, H.; Chen, H.; Shi, Y.;
et al. Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl2/O2 Plasma. Materials 2025, 18, 1903.
https://doi.org/10.3390/ma18091903
AMA Style
Tang Z, Lv Y, Ang K, Wang B, Jiang X, Wang Y, Xu J, Meng H, Chen H, Shi Y,
et al. Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl2/O2 Plasma. Materials. 2025; 18(9):1903.
https://doi.org/10.3390/ma18091903
Chicago/Turabian Style
Tang, Zaifeng, Yukun Lv, Kaiqu Ang, Bing Wang, Xiaojun Jiang, Yuwei Wang, Jin Xu, Hua Meng, Hongli Chen, Ying Shi,
and et al. 2025. "Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl2/O2 Plasma" Materials 18, no. 9: 1903.
https://doi.org/10.3390/ma18091903
APA Style
Tang, Z., Lv, Y., Ang, K., Wang, B., Jiang, X., Wang, Y., Xu, J., Meng, H., Chen, H., Shi, Y., & Wang, L.
(2025). Investigation of the Etching Resistance of Yttrium Oxyfluoride Coating Deposited via Atmospheric Plasma Spraying Against Cl2/O2 Plasma. Materials, 18(9), 1903.
https://doi.org/10.3390/ma18091903
