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Journal: Materials, 2023
Volume: 16
Number: 3820
Article:
Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled
Authors:
by
Wonnyoung Jeong, Sijun Kim, Youngseok Lee, Chulhee Cho, Inho Seong, Yebin You, Minsu Choi, Jangjae Lee, Youbin Seol and Shinjae You
Link:
https://www.mdpi.com/1996-1944/16/10/3820
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