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Journal: Materials, 2023
Volume: 16
Number: 3820

Article: Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled
Authors: by Wonnyoung Jeong, Sijun Kim, Youngseok Lee, Chulhee Cho, Inho Seong, Yebin You, Minsu Choi, Jangjae Lee, Youbin Seol and Shinjae You
Link: https://www.mdpi.com/1996-1944/16/10/3820

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