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Journal: SensorsVolume: 22Number: 6029
Article: Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2
  • Authors:
  • Youngseok Lee1,
  • Sijun Kim1 and
  • Jangjae Lee2
  • et al.
Link: https://www.mdpi.com/1424-8220/22/16/6029

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