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Journal: Sensors, 2022
Volume: 22
Number: 6029

Article: Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2
Authors: by Youngseok Lee, Sijun Kim, Jangjae Lee, Chulhee Cho, Inho Seong and Shinjae You
Link: https://www.mdpi.com/1424-8220/22/16/6029

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