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Journal: Sensors, 2022
Volume: 22
Number: 6029
Article:
Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO2
Authors:
by
Youngseok Lee, Sijun Kim, Jangjae Lee, Chulhee Cho, Inho Seong and Shinjae You
Link:
https://www.mdpi.com/1424-8220/22/16/6029
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