Sánchez-Gómez, R.; Becerro de Bengoa-Vallejo, R.; Losa-Iglesias, M.E.; Calvo-Lobo, C.; Romero-Morales, C.; Martínez-Jiménez, E.M.; Palomo-López, P.; López-López, D.
Heel Height as an Etiology of Hallux Abductus Valgus Development: An electromagnetic Static and Dynamic First Metatarsophalangeal Joint Study. Sensors 2019, 19, 1328.
https://doi.org/10.3390/s19061328
AMA Style
Sánchez-Gómez R, Becerro de Bengoa-Vallejo R, Losa-Iglesias ME, Calvo-Lobo C, Romero-Morales C, Martínez-Jiménez EM, Palomo-López P, López-López D.
Heel Height as an Etiology of Hallux Abductus Valgus Development: An electromagnetic Static and Dynamic First Metatarsophalangeal Joint Study. Sensors. 2019; 19(6):1328.
https://doi.org/10.3390/s19061328
Chicago/Turabian Style
Sánchez-Gómez, Rubén, Ricardo Becerro de Bengoa-Vallejo, Marta Elena Losa-Iglesias, César Calvo-Lobo, Carlos Romero-Morales, Eva María Martínez-Jiménez, Patricia Palomo-López, and Daniel López-López.
2019. "Heel Height as an Etiology of Hallux Abductus Valgus Development: An electromagnetic Static and Dynamic First Metatarsophalangeal Joint Study" Sensors 19, no. 6: 1328.
https://doi.org/10.3390/s19061328
APA Style
Sánchez-Gómez, R., Becerro de Bengoa-Vallejo, R., Losa-Iglesias, M. E., Calvo-Lobo, C., Romero-Morales, C., Martínez-Jiménez, E. M., Palomo-López, P., & López-López, D.
(2019). Heel Height as an Etiology of Hallux Abductus Valgus Development: An electromagnetic Static and Dynamic First Metatarsophalangeal Joint Study. Sensors, 19(6), 1328.
https://doi.org/10.3390/s19061328