Search Results (5)

In this study, lanthanum–nitrogen co-doped titanium dioxide (La-N-TiO₂) thin films were fabricated using Ion Beam Assisted Deposition (IBAD) and subjected to accelerated ultraviolet (UV) aging experiments to systematically investigate the impact of co-doping on the films’ resistance to UV aging. X-ray diffraction (XRD) analysis revealed that La-N co-doping inhibits the phase transition from anatase to rutile, significantly enhancing the phase stability of the films. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) characterizations indicated that co-doping increased the density and surface uniformity of the films, thereby delaying the expansion of cracks and increase in roughness induced by UV exposure. Energy-dispersive X-ray spectroscopy (EDS) results confirmed the successful incorporation of La and N into the TiO₂ lattice, enhancing the chemical stability of the films. Contact angle tests demonstrated that La-N co-doping markedly improved the hydrophobicity of the films, inhibiting the rapid decay of hydrophilicity during UV aging. After three years of UV aging, the co-doped films maintained high structural integrity and photocatalytic performance, exhibiting excellent resistance to UV aging. These findings offer new insights into the long-term stability of photovoltaic self-cleaning materials. Full article

Mechanically flexible substrates are increasingly utilized in electronics and advanced energy technologies like solar cells and high-temperature superconducting coated conductors (HTS-CCs). These substrates offer advantages, such as large surface areas and reduced manufacturing costs through reel-to-reel processing, but often lack the surface smoothness needed for optimal performance. For HTS-CCs, specific orientation and high crystalline quality are essential, requiring buffer layers to prepare the amorphous substrate for superconductor deposition. Techniques, such as mechanical polishing, electropolishing, and chemical-mechanical polishing, can help achieve an optimally levelled surface suitable for the subsequent steps of sputtering and ion-beam-assisted deposition (IBAD) necessary for texturing. This review examines Solution Deposition Planarization (SDP) as a cost-effective alternative to traditional electro-mechanical polishing for HTS coated conductors. SDP achieves surface roughness levels below 1 nm through multiple oxide layer coatings, offering reduced production costs. Comparative studies demonstrate planarization efficiencies of up to 20%. Ongoing research aims to enhance SDP’s efficiency for industrial applications in CC production. Full article

Ion beam-assisted deposition (IBAD) has been proposed as a promising texturing technology that uses the film epitaxy method to obtain biaxial texture on a non-textured metal or compound substrate. Magnesium oxide (MgO) is the most well explored texturing material. In order to obtain the optimal biaxial texture, the actual thickness of the IBAD-MgO film must be controlled within 12nm. Due to the bombardment of ion beams, IBAD-MgO has large lattice deformation, poor texture, and many defects in the films. In this work, the solution deposition planarization (SDP) method was used to deposit oxide amorphous Y₂O₃ films on the surface of Hastelloy C276 tapes instead of the electrochemical polishing, sputtering-Al₂O₃ and sputtering-Y₂O₃ in the commercialized buffer layer. An additional homogeneous epitaxy MgO (epi-MgO) layer, which was used to improve the biaxial texture in the IBAD-MgO layer, was deposited on the IBAD-MgO layer by electron-beam evaporation. The effects of growth temperature, film thickness, deposition rate, and oxygen pressure on the texture and morphology of the epi-MgO film were systematically studied. The best full width at half maximum (FWHM) values were 2.2° for the out-of-plane texture and 4.8° for the in-plane texture for epi-MgO films, respectively. Subsequently, the LaMnO₃ cap layer and YBa₂Cu₃O₇-x (YBCO) functional layer were deposited on the epi-MgO layer to test the quality of the MgO layer. Finally, the critical current density of the YBCO films was 6 MA/cm² (77 K, 500 nm, self-field), indicating that this research provides a high-quality MgO substrate for the YBCO layer. Full article

We report the local structural and superconducting properties of undoped and Ag-doped YBa₂Cu₃O_6+x (YBCO) films with a thickness of up to 1 µm prepared by pulsed laser deposition on SrTiO₃ (STO) single crystals and on ion-beam-assisted deposition (IBAD) and rolling-assisted biaxially textured substrate (RABiTS)-based metal templates. X-ray diffraction demonstrates the high crystalline quality of the films on both single crystalline substrates and metal-based templates, respectively. Although there was only a slight decrease in T_c of up to 1.5 K for the Ag-doped YBCO films on all substrates, we found significant changes in their transport characteristics. The effect of the silver doping mainly depended on the concentration of silver, the type of substrate, and the temperature and magnetic field. In general, the greatest improvement in J_c over a wide range of magnetic fields and temperatures was observed for the 5%Ag-doped YBCO films on STO substrates, showing a significant increase compared to undoped films. Furthermore, a slight J_c improvement was observed for the 2%Ag-doped YBCO films on the RABiTS templates at temperatures below 65 K, whereas J_c decreased for the Ag-doped films on IBAD-MgO-based templates compared to undoped YBCO films. Using detailed electron microscopy studies, small changes in the local microstructure of the Ag-doped YBCO films were revealed; however, no clear correlation was found with the transport properties of the films. Full article

Microelectrode array (MEA) is a tool used for recording bioelectric signals from electrically active cells in vitro. In this paper, ion beam assisted electron beam deposition (IBAD) has been used for depositing indium tin oxide (ITO) and titanium nitride (TiN) thin films which are applied as transparent track and electrode materials in MEAs. In the first version, both tracks and electrodes were made of ITO to guarantee full transparency and thus optimal imaging capability. In the second version, very thin (20 nm) ITO electrodes were coated with a thin (40 nm) TiN layer to decrease the impedance of Ø30 µm electrodes to one third (1200 kΩ → 320 kΩ) while maintaining (partial) transparency. The third version was also composed of transparent ITO tracks, but the measurement properties were optimized by using thick (200 nm) opaque TiN electrodes. In addition to the impedance, the optical transmission and electric noise levels of all three versions were characterized and the functionality of the MEAs was successfully demonstrated using human pluripotent stem cell-derived neuronal cells. To understand more thoroughly the factors contributing to the impedance, MEAs with higher IBAD ITO thickness as well as commercial sputter-deposited and highly conductive ITO were fabricated for comparison. Even if the sheet-resistance of our IBAD ITO thin films is very high compared to the sputtered one, the impedances of the MEAs of each ITO grade were found to be practically equal (e.g., 300–370 kΩ for Ø30 µm electrodes with 40 nm TiN coating). This implies that the increased resistance of the tracks, either caused by lower thickness or lower conductivity, has hardly any contribution to the impedance of the MEA electrodes. The impedance is almost completely defined by the double-layer interface between the electrode top layer and the medium including cells. Full article