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Keywords = injected charge drift current

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13 pages, 1876 KiB  
Article
Total Ionizing Dose Effects on Lifetime of NMOSFETs Due to Hot Carrier-Induced Stress
by Yujuan He, Rui Gao, Teng Ma, Xiaowen Zhang, Xianyu Zhang and Yintang Yang
Electronics 2025, 14(13), 2563; https://doi.org/10.3390/electronics14132563 - 25 Jun 2025
Viewed by 363
Abstract
This study systematically investigates the mechanism by which total ionizing dose (TID) affects the lifetime degradation of NMOS devices induced by hot-carrier injection (HCI). Experiments involved Cobalt-60 (Co-60) gamma-ray irradiation to a cumulative dose of 500 krad (Si), followed by 168 h annealing [...] Read more.
This study systematically investigates the mechanism by which total ionizing dose (TID) affects the lifetime degradation of NMOS devices induced by hot-carrier injection (HCI). Experiments involved Cobalt-60 (Co-60) gamma-ray irradiation to a cumulative dose of 500 krad (Si), followed by 168 h annealing at 100 °C to simulate long-term stability. However, under HCI stress conditions (VD = 2.7 V, VG = 1.8 V), irradiated devices show a 6.93% increase in threshold voltage shift (ΔVth) compared to non-irradiated counterparts. According to the IEC 62416 standard, the lifetime degradation of irradiated devices induced by HCI stress is only 65% of that of non-irradiated devices. Conversely, when the saturation drain current (IDsat) degrades by 10%, the lifetime doubles compared to non-irradiated counterparts. Mechanistic analysis demonstrates that partial neutralization of E’ center positive charges at the gate oxide interface by hot electrons weakens the electric field shielding effect, accelerating ΔVth drift, while interface trap charges contribute minimally to degradation due to annealing-induced self-healing. The saturation drain current shift degradation primarily correlates with electron mobility variations. This work elucidates the multi-physics mechanisms through which TID impacts device reliability and provides critical insights for radiation-hardened design optimization. Full article
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23 pages, 6855 KiB  
Article
Investigation of a Physical Model for the Reverse Recovery Characteristics of PT-PIN FRD with a Buffer Layer
by Yameng Sun, Kun Ma, Xiong Yuan, Anning Chen, Xun Liu, Yifan Song, Xuehan Li, Tongtong Zi, Yang Zhou and Sheng Liu
Electronics 2025, 14(3), 570; https://doi.org/10.3390/electronics14030570 - 31 Jan 2025
Viewed by 637
Abstract
As application conditions become increasingly demanding and usage becomes more aggressive, the performance of traditional insulated gate bipolar transistor (IGBT) and fast recovery diode (FRD) systems can no longer meet the required specifications. In these systems, FRDs are required to carry load current [...] Read more.
As application conditions become increasingly demanding and usage becomes more aggressive, the performance of traditional insulated gate bipolar transistor (IGBT) and fast recovery diode (FRD) systems can no longer meet the required specifications. In these systems, FRDs are required to carry load current and allow current to return from the load to the IGBTs. Consequently, the reverse recovery performance of the FRDs significantly restricts the overall efficiency of the system. Therefore, how to predict the reverse recovery characteristics of the FRDs with greater precision has attracted considerable attention. In this context, this paper presents an in-depth investigation of the high-level injection carrier distribution and reverse recovery characteristics of punchthrough P-I-N (PT-PIN) FRD with a buffer layer. Specifically, the research explores the physical properties of the materials, doping concentrations, and the geometric structure of the devices. Furthermore, it takes into account the complex interactions among carrier recombination, diffusion, and drift, leading to the development of a model that delineates the spatial distribution of carriers and their influence on current conduction. Building upon the traditional step-wise analysis method, subsequently, the temporal aspects of the FRDs reverse recovery process were further segmented. Utilizing the derived carrier distribution model, a reverse recovery analytical model was constructed. The model was validated using a 1200 V, 100 A IGBT with 1200 V, 60 A FRD configured in a reverse parallel arrangement, which demonstrated a 5% improvement in prediction accuracy of VR compared with previous models that employed the lumped charge method. Finally, a range of experiments with varying RG, VCC and IF confirmed the broad applicability of this analytical model. Full article
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12 pages, 4150 KiB  
Article
4H-SiC MOSFET Threshold Voltage Instability Evaluated via Pulsed High-Temperature Reverse Bias and Negative Gate Bias Stresses
by Laura Anoldo, Edoardo Zanetti, Walter Coco, Alfio Russo, Patrick Fiorenza and Fabrizio Roccaforte
Materials 2024, 17(8), 1908; https://doi.org/10.3390/ma17081908 - 20 Apr 2024
Cited by 3 | Viewed by 2532
Abstract
This paper presents a reliability study of a conventional 650 V SiC planar MOSFET subjected to pulsed HTRB (High-Temperature Reverse Bias) stress and negative HTGB (High-Temperature Gate Bias) stress defined by a TCAD static simulation showing the electric field distribution across the SiC/SiO [...] Read more.
This paper presents a reliability study of a conventional 650 V SiC planar MOSFET subjected to pulsed HTRB (High-Temperature Reverse Bias) stress and negative HTGB (High-Temperature Gate Bias) stress defined by a TCAD static simulation showing the electric field distribution across the SiC/SiO2 interface. The instability of several electrical parameters was monitored and their drift analyses were investigated. Moreover, the shift of the onset of the Fowler–Nordheim gate injection current under stress conditions provided a reliable method to quantify the trapped charge inside the gate oxide bulk, and it allowed us to determine the real stress conditions. Moreover, it has been demonstrated from the cross-correlation, the TCAD simulation, and the experimental ΔVth and ΔVFN variation that HTGB stress is more severe compared to HTRB. In fact, HTGB showed a 15% variation in both ΔVth and ΔVFN, while HTRB showed only a 4% variation in both ΔVth and ΔVFN. The physical explanation was attributed to the accelerated degradation of the gate insulator in proximity to the source region under HTGB configuration. Full article
(This article belongs to the Special Issue Silicon Carbide: Material Growth, Device Processing and Applications)
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14 pages, 2021 KiB  
Review
Energetic Neutral Atom Imaging of the Earth’s Ring Current and Some Results from the Chinese Double Star Program
by Zhiqing Chen, Chao Shen, Qiong Wu, Li Lu, Xianguo Zhang and Qinglong Yu
Magnetochemistry 2023, 9(1), 29; https://doi.org/10.3390/magnetochemistry9010029 - 12 Jan 2023
Viewed by 2219
Abstract
The ring current region in the Earth’s magnetosphere contains energetic charged particles, which are injected from the magnetotail, get trapped in the inner magnetosphere, and finally drift around the Earth. The current, essentially carried by ions, is caused by the differences between the [...] Read more.
The ring current region in the Earth’s magnetosphere contains energetic charged particles, which are injected from the magnetotail, get trapped in the inner magnetosphere, and finally drift around the Earth. The current, essentially carried by ions, is caused by the differences between the drift of the positively charged ions and that of negatively charged electrons. The charge exchange that occurs between ring current ions and geocoronal atoms determines the distribution and evolution of the ring current and lays the basis for remote detection techniques. By measuring the energetic neutral atoms produced by the charge-exchange process, the ring current can be remotely detected via energetic neutral atom imaging. The Chinese Double Star Program operated the NeUtral Atom Detector Unit (NUADU) onboard one of its two satellites for more than four years. A variety of studies were conducted using multiple methods applied to observations, such as intuitive image inspection, forward modeling, and inversion. Energetic neutral atom imaging was established as a promising technique for future imaging projects. Full article
(This article belongs to the Special Issue Magnetodynamics of Space Plasmas)
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11 pages, 4444 KiB  
Article
Experimental Study of the Positive Ion Feedback from Gas to Liquid in a Dual-Phase Argon Chamber and Measurement of the Ion Mobility in Argon Gas
by Luciano Romero, Roberto Santorelli, Edgar Sánchez García, Thorsten Lux, Michael Leyton, Silvestro di Luise, Pablo García Abia, Rodrigo López Manzano, José Manuel Cela-Ruiz, Sebastián Quizhpi and Vicente Pesudo
Universe 2022, 8(2), 134; https://doi.org/10.3390/universe8020134 - 21 Feb 2022
Cited by 1 | Viewed by 1921
Abstract
The dynamics of the positive ions created by particle interactions inside argon time projection chambers plays an important role in characterizing the next generation of massive detectors planned for the direct search for dark matter and the study of neutrino properties. We have [...] Read more.
The dynamics of the positive ions created by particle interactions inside argon time projection chambers plays an important role in characterizing the next generation of massive detectors planned for the direct search for dark matter and the study of neutrino properties. We have constructed a 1 L liquid argon chamber (ARION: ARgon ION experiment) with a high voltage pulse generator capable of injecting, in a controlled manner, a sizeable ion current into the drift region. This chamber is capable of reproducing a volume charge similar to that found in large detectors, allowing its effects to be studied systematically. New experimental results regarding ion dynamics in the liquid and direct demonstration of ion feedback from the gas to the liquid are discussed in this paper. In addition, a novel technique to measure the drift velocity of argon ions is introduced along with preliminary results obtained in gas. Full article
(This article belongs to the Special Issue Studying the Universe from Spain)
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8 pages, 4773 KiB  
Article
Highly Efficient Small Anode Ion Source
by Vadim Dudnikov and Andrei Dudnikov
Plasma 2021, 4(2), 214-221; https://doi.org/10.3390/plasma4020013 - 25 Mar 2021
Viewed by 3171
Abstract
We describe some modifications to a Bernas-type ion source that improve the ion beam production efficiency and source operating lifetime. The ionization efficiency of a Bernas type ion source has been improved by using a small anode that is a thin rod, oriented [...] Read more.
We describe some modifications to a Bernas-type ion source that improve the ion beam production efficiency and source operating lifetime. The ionization efficiency of a Bernas type ion source has been improved by using a small anode that is a thin rod, oriented along the magnetic field. The transverse electric field of the small anode causes the plasma to drift in the crossed ExB field to the emission slit. The cathode material recycling was optimized to increase the operating lifetime, and the wall potential optimized to suppress deposition of material and subsequent flake formation. A three-electrode extraction system was optimized for low energy ion beam production and efficient space charge neutralization. An ion beam with emission current density up to 60 mA/cm2 has been extracted from the modified source running on BF3 gas. Space charge neutralization of positive ion beams was improved by injecting electronegative gases. Full article
(This article belongs to the Special Issue Low Temperature Plasmas for Ion Beam Generation)
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17 pages, 7123 KiB  
Article
A Low-Noise X-ray Astronomical Silicon-On-Insulator Pixel Detector Using a Pinned Depleted Diode Structure
by Hiroki Kamehama, Shoji Kawahito, Sumeet Shrestha, Syunta Nakanishi, Keita Yasutomi, Ayaki Takeda, Takeshi Go Tsuru and Yasuo Arai
Sensors 2018, 18(1), 27; https://doi.org/10.3390/s18010027 - 23 Dec 2017
Cited by 24 | Viewed by 6345
Abstract
This paper presents a novel full-depletion Si X-ray detector based on silicon-on-insulator pixel (SOIPIX) technology using a pinned depleted diode structure, named the SOIPIX-PDD. The SOIPIX-PDD greatly reduces stray capacitance at the charge sensing node, the dark current of the detector, and capacitive [...] Read more.
This paper presents a novel full-depletion Si X-ray detector based on silicon-on-insulator pixel (SOIPIX) technology using a pinned depleted diode structure, named the SOIPIX-PDD. The SOIPIX-PDD greatly reduces stray capacitance at the charge sensing node, the dark current of the detector, and capacitive coupling between the sensing node and SOI circuits. These features of the SOIPIX-PDD lead to low read noise, resulting high X-ray energy resolution and stable operation of the pixel. The back-gate surface pinning structure using neutralized p-well at the back-gate surface and depleted n-well underneath the p-well for all the pixel area other than the charge sensing node is also essential for preventing hole injection from the p-well by making the potential barrier to hole, reducing dark current from the Si-SiO2 interface and creating lateral drift field to gather signal electrons in the pixel area into the small charge sensing node. A prototype chip using 0.2 μm SOI technology shows very low readout noise of 11.0 erms, low dark current density of 56 pA/cm2 at −35 °C and the energy resolution of 200 eV(FWHM) at 5.9 keV and 280 eV (FWHM) at 13.95 keV. Full article
(This article belongs to the Section Physical Sensors)
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14 pages, 1840 KiB  
Article
Study of Charge Carrier Transport in GaN Sensors
by Eugenijus Gaubas, Tomas Ceponis, Edmundas Kuokstis, Dovile Meskauskaite, Jevgenij Pavlov and Ignas Reklaitis
Materials 2016, 9(4), 293; https://doi.org/10.3390/ma9040293 - 18 Apr 2016
Cited by 6 | Viewed by 4837
Abstract
Capacitor and Schottky diode sensors were fabricated on GaN material grown by hydride vapor phase epitaxy and metal-organic chemical vapor deposition techniques using plasma etching and metal deposition. The operational characteristics of these devices have been investigated by profiling current transients and by [...] Read more.
Capacitor and Schottky diode sensors were fabricated on GaN material grown by hydride vapor phase epitaxy and metal-organic chemical vapor deposition techniques using plasma etching and metal deposition. The operational characteristics of these devices have been investigated by profiling current transients and by comparing the experimental regimes of the perpendicular and parallel injection of excess carrier domains. Profiling of the carrier injection location allows for the separation of the bipolar and the monopolar charge drift components. Carrier mobility values attributed to the hydride vapor phase epitaxy (HVPE) GaN material have been estimated as μe = 1000 ± 200 cm2/Vs for electrons, and μh = 400 ± 80 cm2/Vs for holes, respectively. Current transients under injection of the localized and bulk packets of excess carriers have been examined in order to determine the surface charge formation and polarization effects. Full article
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35 pages, 6920 KiB  
Article
Profiling of Current Transients in Capacitor Type Diamond Sensors
by Eugenijus Gaubas, Tomas Ceponis, Dovile Meskauskaite and Nikolai Kazuchits
Sensors 2015, 15(6), 13424-13458; https://doi.org/10.3390/s150613424 - 8 Jun 2015
Cited by 8 | Viewed by 6685
Abstract
The operational characteristics of capacitor-type detectors based on HPHT and CVD diamond have been investigated using perpendicular and parallel injection of carrier domain regimes. Simulations of the drift-diffusion current transients have been implemented by using dynamic models based on Shockley-Ramo’s theorem, under injection [...] Read more.
The operational characteristics of capacitor-type detectors based on HPHT and CVD diamond have been investigated using perpendicular and parallel injection of carrier domain regimes. Simulations of the drift-diffusion current transients have been implemented by using dynamic models based on Shockley-Ramo’s theorem, under injection of localized surface domains and of bulk charge carriers. The bipolar drift-diffusion regimes have been analyzed for the photo-induced bulk domain (packet) of excess carriers. The surface charge formation and polarization effects dependent on detector biasing voltage have been revealed. The screening effects ascribed to surface charge and to dynamics of extraction of the injected bulk excess carrier domain have been separated and explained. The parameters of drift mobility of the electrons μe = 4000 cm2/Vs and holes μh = 3800 cm2/Vs have been evaluated for CVD diamond using the perpendicular profiling of currents. The coefficient of carrier ambipolar diffusion Da = 97 cm2/s and the carrier recombination lifetime τR,CVD ≌ 110 ns in CVD diamond were extracted by combining analysis of the transients of the sensor current and the microwave probed photoconductivity. The carrier trapping with inherent lifetime τR,HPHT ≌ 2 ns prevails in HPHT diamond. Full article
(This article belongs to the Section Physical Sensors)
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34 pages, 907 KiB  
Article
Currents Induced by Injected Charge in Junction Detectors
by Eugenijus Gaubas, Tomas Ceponis and Vidas Kalesinskas
Sensors 2013, 13(9), 12295-12328; https://doi.org/10.3390/s130912295 - 12 Sep 2013
Cited by 10 | Viewed by 6262
Abstract
The problem of drifting charge-induced currents is considered in order to predict the pulsed operational characteristics in photo-and particle-detectors with a junction controlled active area. The direct analysis of the field changes induced by drifting charge in the abrupt junction devices with a [...] Read more.
The problem of drifting charge-induced currents is considered in order to predict the pulsed operational characteristics in photo-and particle-detectors with a junction controlled active area. The direct analysis of the field changes induced by drifting charge in the abrupt junction devices with a plane-parallel geometry of finite area electrodes is presented. The problem is solved using the one-dimensional approach. The models of the formation of the induced pulsed currents have been analyzed for the regimes of partial and full depletion. The obtained solutions for the current density contain expressions of a velocity field dependence on the applied voltage, location of the injected surface charge domain and carrier capture parameters. The drift component of this current coincides with Ramo’s expression. It has been illustrated, that the synchronous action of carrier drift, trapping, generation and diffusion can lead to a vast variety of possible current pulse waveforms. Experimental illustrations of the current pulse variations determined by either the rather small or large carrier density within the photo-injected charge domain are presented, based on a study of Si detectors. Full article
(This article belongs to the Special Issue Photodetectors)
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