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Plasma
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Low Temperature Plasmas for Ion Beam Generation
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Low Temperature Plasmas for Ion Beam Generation

A special issue of Plasma (ISSN 2571-6182).

Deadline for manuscript submissions: closed (30 May 2022) | Viewed by 19797

Special Issue Editor

Dr. Ian G. Brown

E-Mail Website
Guest Editor
Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
Interests: novel applications of plasmas and ion beams; plasma and ion beam interactions with surfaces; ion implantation and material surface modification; new materials synthesis; biological applications of plasma physics; plasma CVD diamond synthesis; thin film and multilayer deposition using plasma and ion beam techniques; vacuum arc plasmas; ion source research and development; basic and applied plasma physics

Special Issue Information

Dear Colleagues,

Ion beams are formed, for the most part, by the extraction of ions from a suitably prepared low temperature plasma and then accelerated electrostatically to the requisite particle energy. Thus, there are two basic components to the overall ion source—plasma production and beam formation. For good beam quality, the plasma must itself possess certain desirable characteristics, such as low ion temperature, low density fluctuation level, high purity, and more.

This Special Issue of Plasma will focus on plasma preparation techniques for ion source plasmas, including novel approaches to suppressing detrimental plasma behavior and increasing its suitability for subsequent beam formation. Topics include but are not limited to plasma generation techniques, noise repression, plasma filtering, plasma and beam diagnostics, and applications. We especially encourage papers describing innovative approaches to high quality ion beam formation from the plasma.

Dr. Ian G. Brown
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Plasma is an international peer-reviewed open access quarterly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • plasma preparation
  • noise suppression
  • plasma purity
  • plasma diagnostics
  • ion beam production
  • novel beam formation techniques

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Published Papers (4 papers)

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Research

14 pages, 9346 KiB  
Article
An Ion Source’s View of Its Plasma
by Peter Spädtke
Plasma 2021, 4(2), 345-358; https://doi.org/10.3390/plasma4020023 - 11 Jun 2021
Cited by 1 | Viewed by 3700
Abstract
Modeling of ion beam extraction from an ECRIS requires special procedures in order to achieve results similar to what is found experimentally. The initial plasma conditions must be included for consistency between experiment and simulation. Space charge forces and their compensation of the [...] Read more.
Modeling of ion beam extraction from an ECRIS requires special procedures in order to achieve results similar to what is found experimentally. The initial plasma conditions must be included for consistency between experiment and simulation. Space charge forces and their compensation of the extracted ion beam become important with increasing beam intensity. Here we consider the various beam-plasma conditions that occur along any beam line. Full article
(This article belongs to the Special Issue Low Temperature Plasmas for Ion Beam Generation)
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13 pages, 3810 KiB  
Article
RF and Microwave Ion Sources Study at Institute of Modern Physics
by Qian Y. Jin, Yu G. Liu, Yang Zhou, Qi Wu, Yao J. Zhai and Liang T. Sun
Plasma 2021, 4(2), 332-344; https://doi.org/10.3390/plasma4020022 - 6 Jun 2021
Cited by 11 | Viewed by 8962
Abstract
Intense ion beam production is of high importance for various versatile applications from accelerator injectors to secondary ion mass spectrometry (SIMS). For these purposes, different types of ion beams are needed and, accordingly, the optimum plasma to produce the desired ion beams. RF-type [...] Read more.
Intense ion beam production is of high importance for various versatile applications from accelerator injectors to secondary ion mass spectrometry (SIMS). For these purposes, different types of ion beams are needed and, accordingly, the optimum plasma to produce the desired ion beams. RF-type plasma features a simple structure, high plasma density and low plasma temperature, which is essential for negative ion beam production. A very compact RF-type ion source using a planar coil antenna has been developed at IMP for negative molecular oxygen ion beam production. In terms of high-intensity positive ion beam production, 2.45 GHz microwave power-excited plasma has been widely used. At IMP, we developed a 2.45 GHz plasma source with both ridged waveguide and coaxial antenna coupling schemes, tested successfully with intense beam production. Thanks to the plasma built with an external planar coil antenna, high O2− production efficiency has been achieved, i.e., up to 43%. With 2.45 GHz microwave plasma, the ridged waveguide can support a higher power coupling of high efficiency that leads to the production of intense hydrogen beams up to 90 emA, whereas the coaxial antenna is less efficient in power coupling to plasma but can lead to attractive ion source compactness, with a reasonable beam extraction of several emA. Full article
(This article belongs to the Special Issue Low Temperature Plasmas for Ion Beam Generation)
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8 pages, 1742 KiB  
Article
Generation of a Metal Ion Beam Using a Vacuum Magnetron Discharge
by Alexey V. Vizir, Efim M. Oks, Maxim V. Shandrikov and Georgy Yu. Yushkov
Plasma 2021, 4(2), 222-229; https://doi.org/10.3390/plasma4020014 - 5 Apr 2021
Cited by 2 | Viewed by 2677
Abstract
We have designed, fabricated and characterized an ion source based on a vacuum magnetron discharge. The magnetron discharge is initiated by a vacuum arc discharge, the plasma of which flows onto the magnetron sputtering target working surface. The vacuum arc material is usually [...] Read more.
We have designed, fabricated and characterized an ion source based on a vacuum magnetron discharge. The magnetron discharge is initiated by a vacuum arc discharge, the plasma of which flows onto the magnetron sputtering target working surface. The vacuum arc material is usually the same as that of the magnetron target. The discharges operate at a residual pressure of 3 × 10−6 Torr without working gas feed. Pulses of vacuum arc (30 μs) and magnetron discharge (up to 300 μs) are applied simultaneously. After ignition by the vacuum arc, the magnetron discharge runs in a self-sustained mode. Cu–Cu, Ag–Ag, Zn–Zn, and Pb–Pb pairs of magnetron target material and vacuum arc cathode material were tested, as well as mixed pairs; for example, Cu vacuum arc cathode and Pb magnetron target. An ion beam was extracted from the discharge plasma by applying an accelerating voltage of up to 20 kV between the plasma expander and grounded electrodes. The ion beam collector current reached 80 mA. The ion beam composition, analyzed by a time-of-flight spectrometer, shows that the beam consists mainly of singly-charged (about 90%) and doubly-charged (about 10% current fraction) magnetron target material ions. The ion beam radial current density non-uniformity was as low as ±5% over a diameter of 6.6 cm, which is the diameter of the source output aperture. Full article
(This article belongs to the Special Issue Low Temperature Plasmas for Ion Beam Generation)
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8 pages, 4773 KiB  
Article
Highly Efficient Small Anode Ion Source
by Vadim Dudnikov and Andrei Dudnikov
Plasma 2021, 4(2), 214-221; https://doi.org/10.3390/plasma4020013 - 25 Mar 2021
Viewed by 2814
Abstract
We describe some modifications to a Bernas-type ion source that improve the ion beam production efficiency and source operating lifetime. The ionization efficiency of a Bernas type ion source has been improved by using a small anode that is a thin rod, oriented [...] Read more.
We describe some modifications to a Bernas-type ion source that improve the ion beam production efficiency and source operating lifetime. The ionization efficiency of a Bernas type ion source has been improved by using a small anode that is a thin rod, oriented along the magnetic field. The transverse electric field of the small anode causes the plasma to drift in the crossed ExB field to the emission slit. The cathode material recycling was optimized to increase the operating lifetime, and the wall potential optimized to suppress deposition of material and subsequent flake formation. A three-electrode extraction system was optimized for low energy ion beam production and efficient space charge neutralization. An ion beam with emission current density up to 60 mA/cm2 has been extracted from the modified source running on BF3 gas. Space charge neutralization of positive ion beams was improved by injecting electronegative gases. Full article
(This article belongs to the Special Issue Low Temperature Plasmas for Ion Beam Generation)
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