Research Progress in Nanomaterials and Processes for Separation Membranes

A special issue of Separations (ISSN 2297-8739). This special issue belongs to the section "Materials in Separation Science".

Deadline for manuscript submissions: closed (20 December 2023) | Viewed by 2159

Special Issue Editors


E-Mail Website
Guest Editor
Laboratoire des Matériaux et du Génie Physique, LMGP, Grenoble INP, Minatec, 3 parvis Louis Néel, CS 50257, 38016 Grenoble, Cedex 1, France
Interests: ALD (atomic layer deposition); CVD (chemical vapour deposition); thin films; membranes; nanoparticles

E-Mail Website
Guest Editor
Laboratoire des Matériaux et du Génie Physique, LMGP, Grenoble INP, Minatec 3 parvis Louis Néel, CS 50257, 38016 Grenoble, Cedex 1, France
Interests: wet chemistry (chemical bath deposition, sol-gel and hydrothermal aspects); membranes; nanostructures; wettability

Special Issue Information

Dear Colleagues,

The daily work of most industrial chemists involves separating the components of large chemical mixtures to obtain pure or purer forms. The energy-intensive processes involved, such as distillation, account for a significant portion of the world's energy consumption. Adopting more energy-efficient methods of purifying chemicals could lead to substantial reductions in energy costs and CO2 emissions. However, the current alternatives to distillation, such as sorting molecules by chemical properties or size, are not well-developed or easily scalable. To address this issue, there is a need to explore better and more easily manufactured membrane technologies. Utilizing the physico-chemical properties of nanomaterials for precise molecular sieving has received widespread attention at both the fundamental and practical levels in separation technology. In this Special Issue, we seek to gather innovative research updates on nanomaterials and process engineering for chemical separation, with the aim of achieving global benefits through improved separation methods.

Dr. Matthieu Weber
Dr. David Riassetto
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Separations is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • nanomaterials
  • sieving
  • separation
  • thin film
  • functionalization
  • membranes

Published Papers (1 paper)

Order results
Result details
Select all
Export citation of selected articles as:

Research

16 pages, 4034 KiB  
Article
Tuning Nanopores in Tubular Ceramic Nanofiltration Membranes with Atmospheric-Pressure Atomic Layer Deposition: Prospects for Pressure-Based In-Line Monitoring of Pore Narrowing
by Michiel Nijboer, Asif Jan, Mingliang Chen, Kevin Batenburg, Julia Peper, Tom Aarnink, Fred Roozeboom, Alexey Kovalgin, Arian Nijmeijer and Mieke Luiten-Olieman
Separations 2024, 11(1), 24; https://doi.org/10.3390/separations11010024 - 9 Jan 2024
Cited by 1 | Viewed by 1930
Abstract
Atomic layer deposition (ALD) is known for its unparalleled control over layer thickness and 3D conformality and could be the future technique of choice to tailor the pore size of ceramic nanofiltration membranes. However, a major challenge in tuning and functionalizing a multichannel [...] Read more.
Atomic layer deposition (ALD) is known for its unparalleled control over layer thickness and 3D conformality and could be the future technique of choice to tailor the pore size of ceramic nanofiltration membranes. However, a major challenge in tuning and functionalizing a multichannel ceramic membrane is posed by its large internal pore volume, which needs to be evacuated during ALD cycling. This may require significant energy and processing time. This study presents a new reactor design, operating at atmospheric pressure, that is able to deposit thin layers in the pores of ceramic membranes. In this design, the reactor wall is formed by the industrial tubular ceramic membrane itself, and carrier gas flows are employed to transport the precursor and co-reactant vapors to the reactive surface groups present on the membrane surface. The layer growth for atmospheric-pressure ALD in this case proceeds similarly to that for state-of-the-art vacuum-based ALD. Moreover, for membrane preparation, this new reactor design has three advantages: (i) monolayers are deposited only at the outer pore mouths rather than in the entire bulk of the porous membrane substrate, resulting in reduced flow resistances for liquid permeation; (ii) an in-line gas permeation method was developed to follow the layer growth in the pores during the deposition process, allowing more precise control over the finished membrane; and (iii) expensive vacuum components and cleanroom environment are eliminated. This opens up a new avenue for ceramic membrane development with nano-scale precision using ALD at atmospheric pressure. Full article
Show Figures

Figure 1

Back to TopTop