Special Issue "Micro/Nanomechanics: From Theory to Application"

A special issue of Materials (ISSN 1996-1944).

Deadline for manuscript submissions: 15 August 2020.

Special Issue Editors

Prof. Dr. Takahiro Namazu
Website
Guest Editor
Department of Mechanical Engineering, Aichi Institute of Technology 1247 Yachigusa, Yakusa, Toyota 470-0392, Japan
Interests: nanomechanics; functional materials; material testing
Special Issues and Collections in MDPI journals
Prof. Dr. Shugo Miyake
Website
Guest Editor
Kobe City College of Technology, Kobe, Japan
Interests: thermophysics; experimental mechanics; material characterization; thermoreflectance method; exothermic reaction

Special Issue Information

Dear Colleagues,

The Special Issue, "Micro-/Nano-Mechanics: From Theory to Application", focuses on the newest technologies in micro-/nano-mechanics for the experimental measurement and theoretical calculation of, not only mechanical properties, but also electrical and thermal properties. In addition, applications focused on the following topics will be considered for inclusion: micro-electromechanical systems (MEMS), nano-electromechanical systems (NEMS), microsensors, smart devices, and electronic devices. The continued growth and challenge of science technologies in all industrial fields fundamentally support life through energy saving, the improvement of global environments, and securing safety. Particularly, the dominating general properties of any devices and materials, micro-/nano-mechanics, and material characteristics fascinate us. Original papers are solicited in order to aid and promote our understanding of these subjects. We are especially interested in, but are not limited to, the following topics: mechanical properties, thermal properties, electric properties, experimental method, testing, MEMS/NEMS devices, and related functional materials. Articles and reviews dealing with the above keywords are very welcome.

Prof. Dr. Takahiro Namazu
Prof. Dr. Shugo Miyake
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2000 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Mechanical reliability
  • Experimental mechanics
  • Testing and measurement
  • Mechanical properties
  • Thermal properties
  • Electric properties
  • MEMS/NEMS devices
  • Related functional materials

Published Papers (1 paper)

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Research

Open AccessArticle
A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm
Materials 2020, 13(3), 771; https://doi.org/10.3390/ma13030771 - 07 Feb 2020
Abstract
Semiconductor nanowires have great application prospects in field effect transistors and sensors. In this study, the process and challenges of manufacturing vertical SiGe/Si nanowire array by using the conventional lithography and novel dry atomic layer etching technology. The final results demonstrate that vertical [...] Read more.
Semiconductor nanowires have great application prospects in field effect transistors and sensors. In this study, the process and challenges of manufacturing vertical SiGe/Si nanowire array by using the conventional lithography and novel dry atomic layer etching technology. The final results demonstrate that vertical nanowires with a diameter less than 20 nm can be obtained. The diameter of nanowires is adjustable with an accuracy error less than 0.3 nm. This technology provides a new way for advanced 3D transistors and sensors. Full article
(This article belongs to the Special Issue Micro/Nanomechanics: From Theory to Application)
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