Feature Papers of Electronic Materials—Third Edition

A special issue of Electronic Materials (ISSN 2673-3978).

Deadline for manuscript submissions: 31 December 2025 | Viewed by 722

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1. Max Planck Institute for Polymer Research, Ackermannweg 10, 55128 Mainz, Germany
2. Department of Molecular Physics, Faculty of Chemistry, Lodz University of Technology, Zeromskiego 116, 90-924 Lodz, Poland
Interests: organic electronics; physical chemical aspects of π-conjugated self-organizing systems and their functionality
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Dear Colleagues,

This is a Special Issue of high-quality papers in open access format by the Editorial Board Members of Electronic Materials, or those invited by the Editorial Office and the Editor-in-Chief.

The objective of this Special Issue is to present a compilation of exceptional, unique articles and comprehensive reviews that cover a wide range of materials relevant to the field of electronics. Our belief is that these articles will be extensively read and will significantly impact the field. We are confident that the high quality and originality of the content will capture the attention of readers and inspire further research and development in this area.

Prof. Dr. Wojciech Pisula
Guest Editor

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Keywords

  • dielectric materials
  • semiconductors
  • low- dimensional semiconductors
  • 2D and quasi-2D semiconductors
  • piezoelectric
  • ferroelectric
  • antiferroelectric
  • conductive metals and alloys
  • magnetic materials
  • superconducting materials
  • optoelectronic materials

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Published Papers (1 paper)

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Research

10 pages, 2242 KiB  
Article
Direct Writing of Metal Nanostructures with Focused Helium Ion Beams
by Vladimir Bruevich, Leila Kasaei, Leonard C. Feldman and Vitaly Podzorov
Electron. Mater. 2024, 5(4), 293-302; https://doi.org/10.3390/electronicmat5040018 - 14 Nov 2024
Viewed by 480
Abstract
A helium ion microscope (HIM) with a focused He+-ion beam of variable flux and energy can be used as a tool for local nanoscale surface modification. In this work, we demonstrate a simple but versatile use of the HIM focused He [...] Read more.
A helium ion microscope (HIM) with a focused He+-ion beam of variable flux and energy can be used as a tool for local nanoscale surface modification. In this work, we demonstrate a simple but versatile use of the HIM focused He ion beam to fabricate conducting metallic nano- and microstructures on arbitrary substrates of varied types and shapes by directly patterning pre-deposited initially discontinuous and highly insulating (>10 TΩ/sq.) ultrathin metal films. Gold or silver films, measuring 3 nm in thickness, thermally evaporated on solid substrates have a discontinuous nanocluster morphology. Such highly resistive films can be made locally conductive using moderate doses (2 × 1016–1017 cm−2) of low-energy (30 KeV) ion bombardment. We show that an HIM can be used to directly “draw” Au and Ag conductive lines and other patterns with a variable sheet resistance as low as 10 kΩ/sq. without the use of additional precursors. This relatively straightforward, high-definition technique of direct writing with an ion beam, free from complex in vacuo catalytic or precursor chemistries, opens up new opportunities for directly fabricating elements of conformal metallic nanocircuits (interconnects, resistors, and contacts) on arbitrary organic or inorganic substrates, including those with highly curved surfaces. Full article
(This article belongs to the Special Issue Feature Papers of Electronic Materials—Third Edition)
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