Molecular Beam Epitaxy of Metal Oxides Thin Films

A special issue of Crystals (ISSN 2073-4352). This special issue belongs to the section "Materials for Energy Applications".

Deadline for manuscript submissions: 31 December 2024 | Viewed by 67

Special Issue Editor

Department of Chemical Engineering and Materials Science, University of Minnesota Twin Cities, Minneapolis, MN 55455 , USA
Interests: film studies; molecular beam epitaxy; growth mechanisms and kinetics; metal oxides thin films; catalysis; spectroscopy

Special Issue Information

Dear Colleagues,

Since its establishment approximately half a century ago, molecular beam epitaxy (MBE) has served as a powerful technique for the precise growth of thin films with atomic-level control, thus offering unique opportunities in the realm of materials science and engineering. This Special Issue aims to highlight the recent developments, challenges, and innovations, specifically regarding applications of MBE to metal oxide thin films.

Metal oxide thin films hold immense potential across various fields, including electronics, photonics, catalysis, energy storage, etc. The utilization of the MBE technique enables researchers to engineer thin films with tailored functionalities, interfaces, and structures, thereby discovering unique properties and applications. This issue will encompass a wide range of topics, including, but not limited to, the following: 

  1. Growth mechanisms and kinetics of metal oxide thin films via MBE.
  2. Design of novel chemistries, enabling MBE synthesis of metal oxides.
  3. Structural, electronic, and optical characterization of MBE-grown metal oxide films.
  4. Metal oxide interface and heterostructures engineering for enhanced functionalities.
  5. Applications of MBE-grown metal oxide thin films in electronic devices, energy conversion/storage, sensors, catalysis, etc.

Dr. Jin Yue
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Crystals is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • molecular beam epitaxy (MBE)
  • metal oxide thin films
  • growth mechanisms and kinetics
  • in situ characterization
  • oxide heterostructures
  • strain engineering
  • electronic devices
  • optoelectronics

Published Papers

This special issue is now open for submission.
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