Compact and Low Crosstalk Echelle Grating Demultiplexer on Silicon-On-Insulator Technology
Daniele Melati *
, Pierre G. Verly, André Delâge, Shurui Wang, Jean Lapointe, Pavel Cheben, Jens H. Schmid, Siegfried Janz and Dan-Xia Xu
, Pierre G. Verly, André Delâge, Shurui Wang, Jean Lapointe, Pavel Cheben, Jens H. Schmid, Siegfried Janz and Dan-Xia Xu
Advanced Electronics and Photonics Research Centre, National Research Council Canada, Ottawa, ON K1A 0R6, Canada
*
Author to whom correspondence should be addressed.
Electronics 2019, 8(6), 687; https://doi.org/10.3390/electronics8060687
Received: 7 May 2019 / Revised: 12 June 2019 / Accepted: 13 June 2019 / Published: 18 June 2019
(This article belongs to the Special Issue Optical Communications and Networks)
Abstract
We report on the design of an ultra-compact integrated wavelength demultiplexer in echelle configuration for the optical O-band realized on silicon-on-insulator technology. The device has four channels with channel spacing of 800 GHz and a small footprint of 260 × 83 μm2. Channel crosstalk lower than −28 dB across the four channels is experimentally demonstrated along with insertion losses of −1.5 dB. View Full-TextKeywords:
demultiplexer; wavelength division multiplexing (WDM); silicon-on-insulator (SOI); integrated photonics; optical o-band; echelle; filter
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Melati, D.; Verly, P.G.; Delâge, A.; Wang, S.; Lapointe, J.; Cheben, P.; Schmid, J.H.; Janz, S.; Xu, D.-X. Compact and Low Crosstalk Echelle Grating Demultiplexer on Silicon-On-Insulator Technology. Electronics 2019, 8, 687.
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