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Article

Growth of Atomic Layer Deposited Ruthenium and Its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen

1
Institute of Applied Physics, Friedrich Schiller University Jena, Albert-Einstein-Str. 15, 07745 Jena, Germany
2
Center of Excellence in Photonics, Fraunhofer Institute for Applied Optics and Precision Engineering IOF, Albert-Einstein-Str. 7, 07745 Jena, Germany
3
Institute of Solid State Physics, Friedrich Schiller University Jena, Helmholtzweg 5, 07743 Jena, Germany
*
Author to whom correspondence should be addressed.
Coatings 2018, 8(11), 413; https://doi.org/10.3390/coatings8110413
Received: 18 September 2018 / Revised: 30 October 2018 / Accepted: 10 November 2018 / Published: 20 November 2018
(This article belongs to the Special Issue Atomic Layer Deposition)
High-density ruthenium (Ru) thin films were deposited using Ru(EtCp)2 (bis(ethylcyclopentadienyl)ruthenium) and oxygen by thermal atomic layer deposition (ALD) and compared to magnetron sputtered (MS) Ru coatings. The ALD Ru film growth and surface roughness show a significant temperature dependence. At temperatures below 200 °C, no deposition was observed on silicon and fused silica substrates. With increasing deposition temperature, the nucleation of Ru starts and leads eventually to fully closed, polycrystalline coatings. The formation of blisters starts at temperatures above 275 °C because of poor adhesion properties, which results in a high surface roughness. The optimum deposition temperature is 250 °C in our tool and leads to rather smooth film surfaces, with roughness values of approximately 3 nm. The ALD Ru thin films have similar morphology compared with MS coatings, e.g., hexagonal polycrystalline structure and high density. Discrepancies of the optical properties can be explained by the higher roughness of ALD films compared to MS coatings. To use ALD Ru for optical applications at short wavelengths (λ = 2–50 nm), further improvement of their film quality is required. View Full-Text
Keywords: atomic layer deposition; sputtering; ruthenium; thin film; optical properties; structural properties; soft X-ray; XUV atomic layer deposition; sputtering; ruthenium; thin film; optical properties; structural properties; soft X-ray; XUV
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MDPI and ACS Style

Müller, R.; Ghazaryan, L.; Schenk, P.; Wolleb, S.; Beladiya, V.; Otto, F.; Kaiser, N.; Tünnermann, A.; Fritz, T.; Szeghalmi, A. Growth of Atomic Layer Deposited Ruthenium and Its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen. Coatings 2018, 8, 413. https://doi.org/10.3390/coatings8110413

AMA Style

Müller R, Ghazaryan L, Schenk P, Wolleb S, Beladiya V, Otto F, Kaiser N, Tünnermann A, Fritz T, Szeghalmi A. Growth of Atomic Layer Deposited Ruthenium and Its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen. Coatings. 2018; 8(11):413. https://doi.org/10.3390/coatings8110413

Chicago/Turabian Style

Müller, Robert, Lilit Ghazaryan, Paul Schenk, Sabrina Wolleb, Vivek Beladiya, Felix Otto, Norbert Kaiser, Andreas Tünnermann, Torsten Fritz, and Adriana Szeghalmi. 2018. "Growth of Atomic Layer Deposited Ruthenium and Its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen" Coatings 8, no. 11: 413. https://doi.org/10.3390/coatings8110413

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