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Open AccessArticle

Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow

1
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Science & Technology, Janiszewskiego 11/17, 50-372 Wroclaw, Poland
2
Institute of Metallurgy and Materials Science, Polish Academy of Sciences, Reymonta 25, 30-059 Cracov, Poland
3
Scottish Universities Physics Alliance (SUPA), Institute of Thin Films, Sensors & Imaging, University of the West of Scotland, High Street, Paisley PA1 2BE, UK
*
Author to whom correspondence should be addressed.
Coatings 2018, 8(11), 412; https://doi.org/10.3390/coatings8110412
Received: 31 August 2018 / Revised: 2 November 2018 / Accepted: 19 November 2018 / Published: 20 November 2018
(This article belongs to the Special Issue Applications of Optical Thin Film Coatings)
In this paper, a comparison of TiO2 thin films prepared by magnetron sputtering with a continuous and pulsed gas flow was presented. Structural, surface, optical, and mechanical properties of deposited titanium dioxide coatings were analyzed with the use of a wide range of measurement techniques. It was found that thin films deposited with a gas impulse had a nanocrystalline rutile structure instead of fibrous-like anatase obtained with a continuous gas flow. TiO2 thin films deposited with both techniques were transparent in the visible wavelength range, however, a much higher refractive index and packing density were observed for coatings deposited by the pulsed gas technique. The application of a gas impulse improved the hardness and scratch resistance of the prepared TiO2 thin films. View Full-Text
Keywords: gas impulse magnetron sputtering; thin films; TiO2; microstructure; surface properties; optical properties; mechanical properties; hardness; scratch resistance gas impulse magnetron sputtering; thin films; TiO2; microstructure; surface properties; optical properties; mechanical properties; hardness; scratch resistance
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MDPI and ACS Style

Wiatrowski, A.; Mazur, M.; Obstarczyk, A.; Wojcieszak, D.; Kaczmarek, D.; Morgiel, J.; Gibson, D. Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow. Coatings 2018, 8, 412.

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