Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow
Wiatrowski, A.; Mazur, M.; Obstarczyk, A.; Wojcieszak, D.; Kaczmarek, D.; Morgiel, J.; Gibson, D. Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow. Coatings 2018, 8, 412. https://doi.org/10.3390/coatings8110412
Wiatrowski A, Mazur M, Obstarczyk A, Wojcieszak D, Kaczmarek D, Morgiel J, Gibson D. Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow. Coatings. 2018; 8(11):412. https://doi.org/10.3390/coatings8110412
Chicago/Turabian StyleWiatrowski, Artur, Michał Mazur, Agata Obstarczyk, Damian Wojcieszak, Danuta Kaczmarek, Jerzy Morgiel, and Des Gibson. 2018. "Comparison of the Physicochemical Properties of TiO2 Thin Films Obtained by Magnetron Sputtering with Continuous and Pulsed Gas Flow" Coatings 8, no. 11: 412. https://doi.org/10.3390/coatings8110412