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Volume 11
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Article

Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy)

by
Yong-Hyun Kim
1,2,
Jong-Sik Kim
1,2,
Dae-Chul Kim
1,2,*,
Young-Woo Kim
1,2,
Jong-Bae Park
1,2,
Duk-Sun Han
1,2 and
Mi-Young Song
1
1
Fundamental Technology Research Division, Institute of Plasma Technology, Korea Institute of Fusion Energy, 37 Dongjangsan-ro, Gunsan-si 54004, Korea
2
Plasma E.I. Convergence Research Center, Korea Institute of Fusion Energy, 37 Dongjangsan-ro, Gunsan-si 54004, Korea
*
Author to whom correspondence should be addressed.
Coatings 2021, 11(8), 993; https://doi.org/10.3390/coatings11080993
Submission received: 29 July 2021 / Revised: 14 August 2021 / Accepted: 17 August 2021 / Published: 20 August 2021
(This article belongs to the Special Issue Surface Modification by Plasma-Based Processes)
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Abstract

We constructed a capacitively coupled plasma (CCP) source and installed various diagnostic tools to perform process diagnosis using a plasma process gas (CxFy). We obtained the energy and mass distributions of the ions and radicals from Ar, C4F8/Ar, and C4F6/Ar plasmas. The energy distribution of the ions incident on the substrate was controlled using the self-bias voltage, and the ion energy was found to be inversely proportional to the mass. The measured species and density of the ions and radicals can help understand plasma process results as they provide information about the ions and radicals incident on the substrate.
Keywords: ion energy distribution; CxFy ion and radical; CCP source ion energy distribution; CxFy ion and radical; CCP source

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MDPI and ACS Style

Kim, Y.-H.; Kim, J.-S.; Kim, D.-C.; Kim, Y.-W.; Park, J.-B.; Han, D.-S.; Song, M.-Y. Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy). Coatings 2021, 11, 993. https://doi.org/10.3390/coatings11080993

AMA Style

Kim Y-H, Kim J-S, Kim D-C, Kim Y-W, Park J-B, Han D-S, Song M-Y. Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy). Coatings. 2021; 11(8):993. https://doi.org/10.3390/coatings11080993

Chicago/Turabian Style

Kim, Yong-Hyun, Jong-Sik Kim, Dae-Chul Kim, Young-Woo Kim, Jong-Bae Park, Duk-Sun Han, and Mi-Young Song. 2021. "Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy)" Coatings 11, no. 8: 993. https://doi.org/10.3390/coatings11080993

APA Style

Kim, Y.-H., Kim, J.-S., Kim, D.-C., Kim, Y.-W., Park, J.-B., Han, D.-S., & Song, M.-Y. (2021). Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy). Coatings, 11(8), 993. https://doi.org/10.3390/coatings11080993

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