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Journal: Coatings, 2021
Volume: 11
Number: 993
993
Article: Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy)
Authors: by Yong-Hyun Kim, Jong-Sik Kim, Dae-Chul Kim, Young-Woo Kim, Jong-Bae Park, Duk-Sun Han and Mi-Young Song
Link: https://www.mdpi.com/2079-6412/11/8/993

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