Kim, Y.-H.; Kim, J.-S.; Kim, D.-C.; Kim, Y.-W.; Park, J.-B.; Han, D.-S.; Song, M.-Y.
Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy). Coatings 2021, 11, 993.
https://doi.org/10.3390/coatings11080993
AMA Style
Kim Y-H, Kim J-S, Kim D-C, Kim Y-W, Park J-B, Han D-S, Song M-Y.
Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy). Coatings. 2021; 11(8):993.
https://doi.org/10.3390/coatings11080993
Chicago/Turabian Style
Kim, Yong-Hyun, Jong-Sik Kim, Dae-Chul Kim, Young-Woo Kim, Jong-Bae Park, Duk-Sun Han, and Mi-Young Song.
2021. "Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy)" Coatings 11, no. 8: 993.
https://doi.org/10.3390/coatings11080993
APA Style
Kim, Y.-H., Kim, J.-S., Kim, D.-C., Kim, Y.-W., Park, J.-B., Han, D.-S., & Song, M.-Y.
(2021). Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy). Coatings, 11(8), 993.
https://doi.org/10.3390/coatings11080993
