Pei, D.; Wang, L.; Ding, M.-H.; Hu, Z.-N.; Zhao, J.-Y.; Zhou, G.-Y.; Feng, Z.-R.
The Effects of Substrate Bias on the Properties of HfC Coatings Deposited by RF Magnetron Sputtering. Coatings 2021, 11, 963.
https://doi.org/10.3390/coatings11080963
AMA Style
Pei D, Wang L, Ding M-H, Hu Z-N, Zhao J-Y, Zhou G-Y, Feng Z-R.
The Effects of Substrate Bias on the Properties of HfC Coatings Deposited by RF Magnetron Sputtering. Coatings. 2021; 11(8):963.
https://doi.org/10.3390/coatings11080963
Chicago/Turabian Style
Pei, Di, Li Wang, Ming-Hui Ding, Zhao-Nan Hu, Jun-Yu Zhao, Gui-Yuan Zhou, and Zheng-Rong Feng.
2021. "The Effects of Substrate Bias on the Properties of HfC Coatings Deposited by RF Magnetron Sputtering" Coatings 11, no. 8: 963.
https://doi.org/10.3390/coatings11080963
APA Style
Pei, D., Wang, L., Ding, M.-H., Hu, Z.-N., Zhao, J.-Y., Zhou, G.-Y., & Feng, Z.-R.
(2021). The Effects of Substrate Bias on the Properties of HfC Coatings Deposited by RF Magnetron Sputtering. Coatings, 11(8), 963.
https://doi.org/10.3390/coatings11080963