Wang, W.-K.; Wang, S.-Y.; Liu, K.-F.; Tsai, P.-C.; Zhang, Y.-H.; Huang, S.-Y.
Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films. Coatings 2020, 10, 637.
https://doi.org/10.3390/coatings10070637
AMA Style
Wang W-K, Wang S-Y, Liu K-F, Tsai P-C, Zhang Y-H, Huang S-Y.
Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films. Coatings. 2020; 10(7):637.
https://doi.org/10.3390/coatings10070637
Chicago/Turabian Style
Wang, Wei-Kai, Sung-Yu Wang, Kuo-Feng Liu, Pi-Chuen Tsai, Yu-Hao Zhang, and Shih-Yung Huang.
2020. "Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films" Coatings 10, no. 7: 637.
https://doi.org/10.3390/coatings10070637
APA Style
Wang, W.-K., Wang, S.-Y., Liu, K.-F., Tsai, P.-C., Zhang, Y.-H., & Huang, S.-Y.
(2020). Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films. Coatings, 10(7), 637.
https://doi.org/10.3390/coatings10070637