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Fu R-D, Chang CK, Chuang M-Y, Chen T-H, Lu S-K, Liu D-S. High Performance Multilayered Organosilicon/Silicon Oxynitride Water Barrier Structure Consecutively Deposited by Plasma-Enhanced Chemical Vapor Deposition at a Low-Temperature. Coatings. 2020; 10(1):11. https://doi.org/10.3390/coatings10010011

Fu, Ren-Da, Che Kai Chang, Ming-Yueh Chuang, Tai-Hong Chen, Shao-Kai Lu, and Day-Shan Liu. 2020. "High Performance Multilayered Organosilicon/Silicon Oxynitride Water Barrier Structure Consecutively Deposited by Plasma-Enhanced Chemical Vapor Deposition at a Low-Temperature" Coatings 10, no. 1: 11. https://doi.org/10.3390/coatings10010011

Fu, R.-D., Chang, C. K., Chuang, M.-Y., Chen, T.-H., Lu, S.-K., & Liu, D.-S. (2020). High Performance Multilayered Organosilicon/Silicon Oxynitride Water Barrier Structure Consecutively Deposited by Plasma-Enhanced Chemical Vapor Deposition at a Low-Temperature. Coatings, 10(1), 11. https://doi.org/10.3390/coatings10010011