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Open AccessArticle

Structural and Mechanical Properties of AlCoCrNi High Entropy Nitride Films: Influence of Process Pressure

Hibrid Materials Center (HMC), Department of Nanotechnology and Advanced Materials Engineering, Sejong University, Seoul 05006, Korea
*
Author to whom correspondence should be addressed.
These authors (Young Seok Kim and Hae Jin Park) contribute equally to this work.
Coatings 2020, 10(1), 10; https://doi.org/10.3390/coatings10010010
Received: 24 November 2019 / Revised: 15 December 2019 / Accepted: 18 December 2019 / Published: 21 December 2019
(This article belongs to the Special Issue Surface Modification and Functionalization of High-Temperature Alloys)
In the present study, novel AlCoCrNi high entropy nitride (HEN) films were deposited on Si substrate by a reactive direct current magnetron sputtering system. In order to investigate the influence of sputtering parameters on the microstructure and mechanical properties of the film, nitrogen flow ratio (RN: 25–100%) and process pressure (1.33 × 10−1–1.33 Pa) were controlled, respectively. All the films were identified as an amorphous phase with composition of near equiatomic ratios, regardless of the conditions of nitrogen flow ratios and process pressures. However, the limited mechanical properties were found for the films deposited under different nitrogen flow ratios with retaining the process pressure of 1.33 Pa. To enhance the mechanical properties of the AlCoCrNi HEN film, process pressure was adjusted. From the transmission electron microscopy (TEM) observation, the structure of the film deposited at the process pressure of 1.33 Pa is identified as a porous and open structure with a number of density-deficient boundary and nano-scale voids. On the other hand, densified morphology of the film was observed at pressure of 1.33 × 10−1 Pa. As a result, the hardness, elastic modulus, and H/E were improved up to 16.8, 243 GPa, and 0.0692, respectively. View Full-Text
Keywords: high entropy nitrides; thin films; amorphous; process pressure; mechanical properties high entropy nitrides; thin films; amorphous; process pressure; mechanical properties
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Kim, Y.S.; Park, H.J.; Lim, K.S.; Hong, S.H.; Kim, K.B. Structural and Mechanical Properties of AlCoCrNi High Entropy Nitride Films: Influence of Process Pressure. Coatings 2020, 10, 10.

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