Li, Z.; Yuan, R.; Guo, X.; Hu, Y.; Liu, Y.; Yu, J.; Xu, K.; Li, Q.; Wang, T.; Sun, Q.;
et al. Stress Engineering in the Optimization of Next-Generation Hafnium-Based Ferroelectric Memory. Nanomaterials 2026, 16, 516.
https://doi.org/10.3390/nano16090516
AMA Style
Li Z, Yuan R, Guo X, Hu Y, Liu Y, Yu J, Xu K, Li Q, Wang T, Sun Q,
et al. Stress Engineering in the Optimization of Next-Generation Hafnium-Based Ferroelectric Memory. Nanomaterials. 2026; 16(9):516.
https://doi.org/10.3390/nano16090516
Chicago/Turabian Style
Li, Zhenhai, Ruihong Yuan, Xingcan Guo, Yiqun Hu, Yongkai Liu, Jiajie Yu, Kangli Xu, Qingxuan Li, Tianyu Wang, Qingqing Sun,
and et al. 2026. "Stress Engineering in the Optimization of Next-Generation Hafnium-Based Ferroelectric Memory" Nanomaterials 16, no. 9: 516.
https://doi.org/10.3390/nano16090516
APA Style
Li, Z., Yuan, R., Guo, X., Hu, Y., Liu, Y., Yu, J., Xu, K., Li, Q., Wang, T., Sun, Q., Zhang, D. W., & Chen, L.
(2026). Stress Engineering in the Optimization of Next-Generation Hafnium-Based Ferroelectric Memory. Nanomaterials, 16(9), 516.
https://doi.org/10.3390/nano16090516