Recent Advances in MoS2-Based Saturable Absorbers for Mode-Locked Fiber Lasers
Abstract
1. Introduction
2. Properties and Fabrication
2.1. Optical and Nonlinear Properties
2.2. Mainstream Preparation Methods for MoS2 SAs
2.3. Performance Characterization Techniques for MoS2 SAs
3. Optimized MoS2 Fiber Lasers
3.1. Pulse Performance Optimization
3.1.1. Pulse Width Compression and Femtosecond Pulse Generation
3.1.2. Enhancement of Single-Pulse Energy and Output Power
3.1.3. Stability Optimization and Environmental Tolerance
3.2. Regulation of Nonlinear Absorption Characteristics
3.2.1. Ultrafast Carrier Relaxation Mechanisms
3.2.2. Material Characterization and Experimental Validation
3.3. Breakthroughs in MoS2-Based Composite SAs
3.3.1. Two-Dimensional Material Heterostructures
3.3.2. MoS2/Polymer Composites
3.3.3. MoS2/Metal Nanostructure Composites
4. Application Comparison and Prospects of Carbon Nanotube and MoS2 SAs
4.1. Application Scenarios and Value Comparison Across Different Wavelength Bands
4.2. Application Evolution of MoS2 and CNT SAs in Mode-Locked Lasers
4.2.1. Physical Mechanisms and Advantages of CNTs and MoS2
4.2.2. Composite Structural Design and Interface Engineering
4.3. Constraints of Intrinsic Material Properties and Breakthroughs via Process Optimization
5. Summary and Outlook
5.1. Research Status and Core Conclusions
5.2. Development Trends and Technical Pathways
5.3. Industrial Viability
Author Contributions
Funding
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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| SA Material | Modulation Depth (%) | Response Time | Damage Threshold | Wavelength Range (μm) | Refs. |
|---|---|---|---|---|---|
| MoS2 (few-layer) | 3.0–20.0 | −30 fs | ≈1.7 GW/cm2 | 1.0–2.0 | [9,19,20,21,22] |
| Graphene | 6.2–66.5 | 0.1–0.5 ps | — | 0.8–2.5 | [23,24] |
| CNTs | 1.0–4.5 | <1 ps | +130% | 1.0–2.0 | [25,26] |
| BP | −15.0 | 24 ± 2 fs | 0.2–0.4 mJ/cm2 | 1.0–3.0 | [27,28,29] |
| MXene (e.g., Ti3C2Tx) | 11.3–50.0 | N/A | 1.5–3.0 GW/cm2 | 1.0–2.5 | [30] |
| Topological Insulator (e.g., Bi2Se3) | 39.8–98.0 | <1 ps | — | 1.0–2.0 | [31,32] |
| SESAM | 0.39–11.5 | 18–100 ps | 0.5–5.0 GW/cm2 | 0.8–2.0 | [3,33,34] |
| Preparation Method | Typical Layer Number | Advantages | Disadvantages | Key Performance Parameters | Refs. |
|---|---|---|---|---|---|
| Mechanical Exfoliation (Scotch Tape Method) | Monolayer/ Few-layer | High crystal quality Low defect density Simple operation | Small flake size Low yield Poor controllability | Modulation Depth: ~2–5% Non-saturable Loss: Low | [10,36] |
| Chemical Vapor Deposition | Monolayer/ Controlled layers | Large area growth Uniform thickness control High optical quality | High equipment cost Complex transfer process High temperature required | Modulation Depth: 5–10% Damage Threshold: High | [54,67] |
| Liquid Phase Exfoliation | Few-layer/ Multi-layer | Low cost Scalable production Easy integration with polymers | Lateral size distribution Potential solvent residues Restacking issues | Modulation Depth: 3–8% Saturation Intensity: Moderate | [56,57] |
| Hydrothermal Method | Multi-layer/ Nanoflowers | Environmentally friendly Good crystallinity Controlled morphology | Long reaction time Aggregation tendency | Modulation Depth: >10% Stability: Good | [44] |
| Fiber Integration/Deposition | — | All-fiber compatibility Low insertion loss Compact structure | Fragile structure Limited interaction length | Modulation Depth: <5% Insertion Loss: Very Low | [12,42] |
| Composite Structure Type | Modulation Depth (%) | Saturation Intensity (MW/cm2) | Damage Threshold (GW/cm2) | Response Time (ps/fs) | Operating Band (nm) | Measurement Conditions (Wavelength/Pulse Width) | References |
|---|---|---|---|---|---|---|---|
| MoS2/Graphene Heterostructure | 5.8–6.5 | 15–25 | >1.5 | <500 fs | 1000/1550 | Z-scan @ 800 nm, ~140 fs; Mode-locking @ 1064 nm, ~350 fs | [96,127] |
| MoS2/BP | 4.2–5.0 | 10–18 | 0.3–0.5 | <300 fs | 2000 | Q-switching @ 1094 nm, ~100 ns; Mode-locking @ 2000 nm, ps regime | [24,120,121,122,123,124,125,126,127,128] |
| MoS2/Polymer | 2.5–3.8 | 20–40 | >1.2 | 0.5–1.0 ps | 1000/1550 | Mode-locking @ 1550 nm, ~500 fs | [74] |
| MoS2/Metal Plasmonic | >8.0 | <10 | 0.2–0.4 | <200 fs | 1550 | Z-scan @ 800 nm, ~100 fs; Mode-locking @ 1550 nm, ~200 fs | [131,132] |
| Mo0.5W0.5S2 Alloy | 3.5–4.5 | 20–40 | >1.2 | 0.5–1.0 ps | 1000/1550 | Q-switching @ 1550 nm, ~800 fs | [133] |
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Huang, J.; Zheng, J.; Xiong, X.; Yang, Y.; Huang, X.; Liu, C. Recent Advances in MoS2-Based Saturable Absorbers for Mode-Locked Fiber Lasers. Nanomaterials 2026, 16, 911. https://doi.org/10.3390/nano16150911
Huang J, Zheng J, Xiong X, Yang Y, Huang X, Liu C. Recent Advances in MoS2-Based Saturable Absorbers for Mode-Locked Fiber Lasers. Nanomaterials. 2026; 16(15):911. https://doi.org/10.3390/nano16150911
Chicago/Turabian StyleHuang, Jiahao, Jiancheng Zheng, Xin Xiong, Yuxian Yang, Xiyan Huang, and Chibiao Liu. 2026. "Recent Advances in MoS2-Based Saturable Absorbers for Mode-Locked Fiber Lasers" Nanomaterials 16, no. 15: 911. https://doi.org/10.3390/nano16150911
APA StyleHuang, J., Zheng, J., Xiong, X., Yang, Y., Huang, X., & Liu, C. (2026). Recent Advances in MoS2-Based Saturable Absorbers for Mode-Locked Fiber Lasers. Nanomaterials, 16(15), 911. https://doi.org/10.3390/nano16150911

