Tao, J.; Jiang, X.; Fan, A.; Hu, X.; Wang, P.; Dong, Z.; Wu, Y.
Effect of Rapid Thermal Annealing on the Characteristics of Micro Zn-Doped Ga2O3 Films by Using Mixed Atomic Layer Deposition. Nanomaterials 2025, 15, 499.
https://doi.org/10.3390/nano15070499
AMA Style
Tao J, Jiang X, Fan A, Hu X, Wang P, Dong Z, Wu Y.
Effect of Rapid Thermal Annealing on the Characteristics of Micro Zn-Doped Ga2O3 Films by Using Mixed Atomic Layer Deposition. Nanomaterials. 2025; 15(7):499.
https://doi.org/10.3390/nano15070499
Chicago/Turabian Style
Tao, Jiajia, Xishun Jiang, Aijie Fan, Xianyu Hu, Ping Wang, Zuoru Dong, and Yingjie Wu.
2025. "Effect of Rapid Thermal Annealing on the Characteristics of Micro Zn-Doped Ga2O3 Films by Using Mixed Atomic Layer Deposition" Nanomaterials 15, no. 7: 499.
https://doi.org/10.3390/nano15070499
APA Style
Tao, J., Jiang, X., Fan, A., Hu, X., Wang, P., Dong, Z., & Wu, Y.
(2025). Effect of Rapid Thermal Annealing on the Characteristics of Micro Zn-Doped Ga2O3 Films by Using Mixed Atomic Layer Deposition. Nanomaterials, 15(7), 499.
https://doi.org/10.3390/nano15070499