Sogemeier, D.; Koniakowsky, I.M.; Hergeth, S.; Naujoks, F.; Keinath, A.
Psychometric Properties and Validation of the Chinese Adaption of the Affinity for Technology Interaction (ATI) Scale. Information 2025, 16, 500.
https://doi.org/10.3390/info16060500
AMA Style
Sogemeier D, Koniakowsky IM, Hergeth S, Naujoks F, Keinath A.
Psychometric Properties and Validation of the Chinese Adaption of the Affinity for Technology Interaction (ATI) Scale. Information. 2025; 16(6):500.
https://doi.org/10.3390/info16060500
Chicago/Turabian Style
Sogemeier, Denise, Ina Marie Koniakowsky, Sebastian Hergeth, Frederik Naujoks, and Andreas Keinath.
2025. "Psychometric Properties and Validation of the Chinese Adaption of the Affinity for Technology Interaction (ATI) Scale" Information 16, no. 6: 500.
https://doi.org/10.3390/info16060500
APA Style
Sogemeier, D., Koniakowsky, I. M., Hergeth, S., Naujoks, F., & Keinath, A.
(2025). Psychometric Properties and Validation of the Chinese Adaption of the Affinity for Technology Interaction (ATI) Scale. Information, 16(6), 500.
https://doi.org/10.3390/info16060500