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Open AccessArticle

Development of a Reflective 193-nm DUV Microscope System for Defect Inspection of Large Optical Surfaces

Center for Scientific Instrumentation, Korea Basic Science Institute, 169-148 Gwahak-ro, Yuseong-gu, Daejeon 34133, Korea
Authors to whom correspondence should be addressed.
Appl. Sci. 2019, 9(23), 5205;
Received: 31 October 2019 / Revised: 26 November 2019 / Accepted: 28 November 2019 / Published: 29 November 2019
(This article belongs to the Special Issue Selected Papers from the ICMR 2019)
We developed a 193-nm deep ultraviolet (DUV) microscope system based on the reflection mode for a precise inspection of various types of defects/cracks on large optical surfaces of the order of one meter in size. Without preprocessing the sample at room temperature and atmospheric pressure, which is commonly necessary for electron microscopy, the reflective 193-nm DUV microscope was used to directly observe optical surface defects in a manner similar to conventional optical microscopes. In addition, the limitations on the selection of materials and thickness of optical samples of transmittive DUV microscopes were overcome. DUV microscope imaging and the analysis on the spatial resolution were verified using a 1D grating structure with a 225-nm line width. This system could be widely applied as an inspection tool because it provides high resolution at the 200-nm scale that is close to the diffraction limit of a 193-nm DUV beam. In the near future, it is expected that our system would be extended to nano/bio imaging as well as the inspection of large optical surfaces. View Full-Text
Keywords: DUV microscope; surface inspection; spatial resolution DUV microscope; surface inspection; spatial resolution
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Kim, H.-S.; Lee, D.-H.; Hyun, S.; Je, S.K.; Park, J.G.; Bae, J.Y.; Kim, G.H.; Kim, I.J. Development of a Reflective 193-nm DUV Microscope System for Defect Inspection of Large Optical Surfaces. Appl. Sci. 2019, 9, 5205.

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