Hwang, I.-T.; Jang, K.-W.; Kim, H.-J.; Lee, S.-H.; Lim, J.-W.; Yang, J.-M.; Kwon, H.-S.; Kim, H.-S.
Analysis of DC Characteristics in GaN-Based Metal-Insulator-Semiconductor High Electron Mobility Transistor with Variation of Gate Dielectric Layer Composition by Considering Self-Heating Effect. Appl. Sci. 2019, 9, 3610.
https://doi.org/10.3390/app9173610
AMA Style
Hwang I-T, Jang K-W, Kim H-J, Lee S-H, Lim J-W, Yang J-M, Kwon H-S, Kim H-S.
Analysis of DC Characteristics in GaN-Based Metal-Insulator-Semiconductor High Electron Mobility Transistor with Variation of Gate Dielectric Layer Composition by Considering Self-Heating Effect. Applied Sciences. 2019; 9(17):3610.
https://doi.org/10.3390/app9173610
Chicago/Turabian Style
Hwang, In-Tae, Kyu-Won Jang, Hyun-Jung Kim, Sang-Heung Lee, Jong-Won Lim, Jin-Mo Yang, Ho-Sang Kwon, and Hyun-Seok Kim.
2019. "Analysis of DC Characteristics in GaN-Based Metal-Insulator-Semiconductor High Electron Mobility Transistor with Variation of Gate Dielectric Layer Composition by Considering Self-Heating Effect" Applied Sciences 9, no. 17: 3610.
https://doi.org/10.3390/app9173610
APA Style
Hwang, I.-T., Jang, K.-W., Kim, H.-J., Lee, S.-H., Lim, J.-W., Yang, J.-M., Kwon, H.-S., & Kim, H.-S.
(2019). Analysis of DC Characteristics in GaN-Based Metal-Insulator-Semiconductor High Electron Mobility Transistor with Variation of Gate Dielectric Layer Composition by Considering Self-Heating Effect. Applied Sciences, 9(17), 3610.
https://doi.org/10.3390/app9173610