Ameduri, S.; Galasso, B.; Noviello, M.C.; Dimino, I.; Concilio, A.; Catalano, P.; D’Aniello, F.A.; Carossa, G.M.; Pinazo, L.; Derry, J.;
et al. Design and Optimization of a Compliant Morphing Trailing Edge for High-Lift Generation. Appl. Sci. 2025, 15, 2529.
https://doi.org/10.3390/app15052529
AMA Style
Ameduri S, Galasso B, Noviello MC, Dimino I, Concilio A, Catalano P, D’Aniello FA, Carossa GM, Pinazo L, Derry J,
et al. Design and Optimization of a Compliant Morphing Trailing Edge for High-Lift Generation. Applied Sciences. 2025; 15(5):2529.
https://doi.org/10.3390/app15052529
Chicago/Turabian Style
Ameduri, Salvatore, Bernardino Galasso, Maria Chiara Noviello, Ignazio Dimino, Antonio Concilio, Pietro Catalano, Francesco Antonio D’Aniello, Giovanni Marco Carossa, Laurent Pinazo, John Derry,
and et al. 2025. "Design and Optimization of a Compliant Morphing Trailing Edge for High-Lift Generation" Applied Sciences 15, no. 5: 2529.
https://doi.org/10.3390/app15052529
APA Style
Ameduri, S., Galasso, B., Noviello, M. C., Dimino, I., Concilio, A., Catalano, P., D’Aniello, F. A., Carossa, G. M., Pinazo, L., Derry, J., Biju, B., & Shreedharan, S.
(2025). Design and Optimization of a Compliant Morphing Trailing Edge for High-Lift Generation. Applied Sciences, 15(5), 2529.
https://doi.org/10.3390/app15052529
