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Article

Thermal Influence on Chirality-Driven Dynamics and Pinning of Transverse Domain Walls in Z-Junction Magnetic Nanowires

by
Mohammed Al Bahri
*,
Salim Al-Kamiyani
,
Mohammed M. Al Hinaai
and
Nisar Ali
Department of Basic and Applied Sciences, A’Sharqiyah University, P.O. Box 42, Ibra 400, Oman
*
Author to whom correspondence should be addressed.
Symmetry 2025, 17(8), 1184; https://doi.org/10.3390/sym17081184
Submission received: 26 June 2025 / Revised: 18 July 2025 / Accepted: 22 July 2025 / Published: 24 July 2025

Abstract

Magnetic nanowires with domain walls (DWs) play a crucial role in the advancement of next-generation memory and spintronic devices. Understanding the thermal effects on domain wall behavior is essential for optimizing performance and stability. This study investigates the thermal chirality-dependent dynamics and pinning of transverse domain walls (TDWs) in Z-junction nanowires using micromagnetic simulations. The analysis focuses on head-to-head (HHW) and tail-to-tail (TTW) domain walls with up and down chirality under varying thermal conditions. The results indicate that higher temperatures reduce the pinning strength and depinning current density, leading to enhanced domain wall velocity. At 200 K, the HHWdown domain wall depins at a critical current density of 1.2 × 1011 A/m2, while HHWup requires a higher depinning temperature, indicating stronger pinning effects. Similarly, the depinning temperature (Td) increases with Z-junction depth (d), reaching 300 K at d = 50 nm, while increasing Z-junction (λ) weakens pinning, reducing Td to 150 K at λ = 50 nm. Additionally, the influence of Z-junction geometry and magnetic properties, such as saturation magnetization (Ms) and anisotropy constant (Ku), is examined to determine their effects on thermal pinning and depinning. These findings highlight the critical role of chirality and thermal activation in domain wall motion, offering insights into the design of energy-efficient, high-speed nanowire-based memory devices.

1. Introduction

The dynamics and pinning of domain walls (DWs) in magnetic nanowires have attracted significant attention for spintronic and memory applications [1,2,3,4,5,6]. Magnetic nanowires are particularly promising for high-density data storage due to their ability to manipulate domain walls as carriers of binary information. Transverse domain walls (TDWs), where magnetization aligns linearly within the wall, are critical to the operation of these devices because of their relatively simple structure and predictable dynamics [7,8,9,10,11,12,13]. The control of TDW motion and pinning are two key factors to optimizing device performance, as it determines read/write speeds, power consumption, and thermal stability.
Domain wall motion is primarily driven by spin-transfer torque (STT), where spin-polarized currents interact with local magnetic moments, causing the domain wall to shift along the nanowire [14,15,16,17,18,19,20]. However, pinning effects at constrictions or material defects can hinder smooth domain wall propagation. These pinning effects are particularly relevant in practical devices, where nanoscale limitations and geometric features are unavoidable [6,20,21,22,23,24]. Consequently, understanding how geometric, material properties, and thermal factors influence pinning and depinning processes is essential for device optimization.
Thermal effects add another layer of significant factors to domain wall dynamics. Elevated temperatures can lead to thermally activated depinning, changes in magnetization behavior, and a reduction in pinning strength. At the same time, thermal fluctuations can influence the chirality-dependent behavior of TDWs, altering their speed and stability [25,26,27,28,29]. For instance, down-chirality domain walls may exhibit distinct dynamics under thermal conditions due to differences in wall energy and magnetization configurations.
Previous studies have explored the role of nanowire geometry and magnetic properties in the thermal dynamics and pinning of domain walls, with findings indicating that these parameters strongly influence wall motion and stability [30,31,32,33,34]. However, the interplay between chirality and thermal effects remains underexplored. The novelty of this work lies in its comprehensive and systematic analysis of chirality-dependent transverse domain wall (TDW) behavior under thermal activation within Z-junction geometries. Specifically, we examine four distinct TDW configurations HHWup, HHWdown, TTWup, and TTWdown across a wide temperature range and correlate their depinning thresholds with geometrical factors (junction depth d and width λ) and intrinsic material properties (saturation magnetization Ms and uniaxial anisotropy Ku). This multidimensional approach reveals that domain wall chirality plays a pivotal role in determining thermal pinning strength. Furthermore, we introduce and analyze the depinning temperature (Td) as a metric to characterize the thermal robustness of different domain wall states, providing a new design parameter for high-temperature spintronic devices.
By investigating how TDWs with different chiralities respond to thermal conditions, this study aims to fill a critical gap in the field. Furthermore, understanding the combined effects of thermal energy, geometric constrictions, and material properties will provide a comprehensive framework for designing robust, energy-efficient nanowire-based memory devices.
The present work focuses on the dynamics and pinning of TDWs in nanowires with Z-junction constrictions. Using micromagnetic simulations, we examine how temperature, chirality, and junction dimensions influence domain wall behavior. This research provides insights into optimizing nanowire-based devices for high-temperature environments, with the goal of enhancing performance in terms of speed, stability, and power efficiency.

2. Modeling

Micromagnetic simulations were conducted using the Object-Oriented Micromagnetic Framework (OOMMF) software (version is 1.2a5) to investigate the thermal dynamics of TDWs. A nanowire with dimensions of 300 nm in length, 60 nm in width, and 5 nm in thickness was modeled. The Z-junction, located at the wire’s center, had varying depths (d) and lengths (λ) (Figure 1).
The simulation device was discretized into small computational cells with dimensions of 2.5 nm × 2.5 nm × 5 nm, ensuring that each cell size remains smaller than the material’s exchange length, which is given by l e x A 2 π M s 2 and calculated to be 5.3 nm. In this study, permalloy was selected as the material, characterized by a saturation magnetization (Ms) of 800 kA/m, α = 0.01 [35,36], an anisotropy constant (Ku) of 0.5 × 105 J/m3 [37], an exchange stiffness (A) of 1.3 × 10−11 J/m, and the time sampling ∆T is 0.1 picoseconds [34].
To analyze magnetization dynamics and domain wall motion, OOMMF [38] was used to solve the Landau–Lifshitz–Gilbert (LLG) equation incorporating both adiabatic and non-adiabatic spin-transfer torques with thermal field [39].
d m d t = γ m × ( H e f f + ( H t h + α m × d m d t u . m + β m × u . m
where α represents the Gilbert damping constant, γ is the gyromagnetic ratio, and β is the non-adiabatic spin-transfer torque parameter. The adiabatic spin-transfer torque parameter u is given by:
u = g P β μ B 2 e α M s J
where J is the current density, g is the Lande factor, P is the spin polarization, μB is the Bohr magneton, and e is the elementary charge.
The nanowire structure includes a constriction at its center, designed by displacing a section along the x-axis. H t h is the thermal field, which accounts for the effect of temperature on the system.
H t h = 2 α k B T γ M s V ξ
where k B is the Boltzmann constant, T the device temperature, Ms is the saturation magnetization, V is the volume of the computational cell, and ξ is a random Gaussian-distributed noise term with zero mean and unit variance [40,41].

3. Results and Discussion

In this study, four different transverse domain wall (TDW) configurations were utilized to explore the impact of wall type and chirality on the pinning behavior in Z-junction magnetic nanowires. As shown in Figure 2, panels (a) and (b) represent HHWs, while panels (c) and (d) illustrate TTWs. In Figure 2a, the HHW exhibits upward chirality, characterized by a clockwise rotation of the magnetization across the wall center. In contrast, Figure 2b shows an HHW with downward chirality, where the magnetization rotates counterclockwise. For the TTWs, Figure 2c displays an upward chirality with clockwise rotation, whereas Figure 2d presents a downward chirality with counterclockwise magnetization rotation. The HHWs involve a convergence of magnetization vectors toward the wall center, typically resulting in higher magnetic charge accumulation and stronger pinning. TTWs, on the other hand, involve a divergence of magnetization vectors at the wall, leading to different depinning behavior. In all configurations, the color map indicates the in-plane magnetization direction (red for +x and blue for −x), and black arrows represent the local magnetization vectors. The Z-shaped junction geometry introduces asymmetry that, when combined with the domain wall type and chirality, significantly influences the thermal stability, pinning strength, and dynamic response of the domain walls. These four configurations provide a systematic framework for studying chirality-dependent pinning and are essential for understanding domain wall motion in spintronic memory applications.
Each TDW configuration exhibits a slightly different relaxed energy state due to chirality and head/tail orientation within the Z-junction. The differences in energy are small but significant enough to influence depinning thresholds, as shown in our results. These states can be experimentally accessed by applying tailored magnetic field pulses or spin-polarized currents to induce desired domain wall chirality and orientation, as demonstrated in previous studies on DW control [16,22,30].

3.1. Chirality-Dependent Dynamics at Varying Temperatures

The influence of temperature on domain wall (DW) speed was first investigated prior to the DW reaching the Z-junction, considering all four chirality configurations. The graphs in Figure 3 illustrate the dependence of domain wall speed on J at temperatures of 200 K and 300 K for different domain wall configurations: HHWdown, HHWup, TTWdown, and TTWup. In all cases, the domain wall speed increases linearly with current density, indicating a direct relationship between applied current and domain wall motion driven by the spin-transfer torque in the Z-junction device with λ = 20 nm and d = 40 nm.
At a higher temperature of 300 K, the domain wall moves faster compared to 200 K under the same current conditions, suggesting that thermal activation assists in overcoming pinning effects and enhances domain wall motion.
Comparing the different configurations in Figure 3, HHWdown and HHWup exhibit similar trends, with HHWup showing slightly higher speeds (Figure 3). TTWdown and TTWup also follow a similar pattern, with TTWup demonstrating slightly greater mobility. TTW configurations generally show higher speeds compared to HHW configurations, indicating that transverse domain walls experience less resistance in motion and are more efficient for current-driven propagation. The temperature effect is more pronounced in TTW configurations, where an increase in temperature leads to a more significant enhancement in domain wall speed compared to HHW configurations. These results highlight the role of temperature in facilitating domain wall motion, which is seen as increasing speed and reducing pinning effects, under the same current density. The higher mobility observed in TTW domain walls suggests that they may be more suitable for applications requiring fast domain wall propagation. The linear relationship between domain wall speed and current density further confirms the influence of the spin-transfer torque, making these findings relevant for spintronic and memory applications.
The enhanced speed of down-chirality TDWs is attributed to their lower wall energy, which reduces resistance to thermal fluctuations. Higher temperatures amplify these effects, leading to greater speed differences between chirality.
This linear behavior persisted across the entire temperature range studied, with the slope of the speed-current density curve decreasing slightly at elevated temperatures due to increased thermal noise.

3.2. HHWup and HHWdown Thermal Pinning

In this study, micromagnetic simulations were conducted to investigate thermal pinning through a Z-junction (λ = 20 nm and d = 40 nm) based on different domain wall chirality. The analysis begins with the HHWdown and HHWup configurations. The HHWdown domain wall, shown in Figure 4a–c and analyzed in graph (g), exhibits a pronounced response to temperature variations. At 100 K, the domain wall remains pinned for an extended period with minimal depinning. However, as the temperature increases to 200 K, the depinning process accelerates, leading to a noticeable rise in the magnetization component mx. The gradual transition in depinning behavior across temperatures suggests that HHWdown is more thermally sensitive, enabling easier depinning as thermal energy increases.
In contrast, the HHWup domain wall, illustrated in Figure 4d–f and examined in graph (h), demonstrates a stronger pinning effect, particularly at lower temperatures. At 200 K, the domain wall experiences significant pinning, taking a longer time to transition compared to HHWdown. However, at 250 K, the depinning process becomes more pronounced, causing an abrupt increase in mx. The more sudden shift in behavior with increasing temperature indicates that HHWup retains greater thermal stability, making it more resistant to temperature-induced depinning.
The comparison between graphs shown in Figure 4g,h further emphasizes the distinction between the two domain wall configurations. HHWdown undergoes a gradual transition from pinned to depinned states, while HHWup exhibits a more abrupt depinning shift at higher temperatures. This suggests that HHWup is better suited for applications requiring robust domain wall retention, while HHWdown, being more thermally sensitive, depins more easily at elevated temperatures, which could affect the reliability of memory storage in high-temperature environments.
For further clarification of HHWdown and HHWup, the investigations focus on pinning and depinning behavior across different values of d and λ. As shown in Figure 5a, the depinning temperature (Td) increases with increasing Z-junction depth (d) for both HHWdown and HHWup domain walls. The HHWup domain wall consistently exhibits a higher depinning temperature than HHWdown, indicating that it requires more thermal energy to overcome the pinning barrier. This trend suggests that a deeper Z-junction provides greater stability for domain walls, reinforcing their resistance to thermal depinning.
In Figure 5b, the depinning temperature decreases as the domain wall width (λ) increases, demonstrating that wider Z-junctions experience weaker pinning effects. Once again, HHWup maintains a higher Td compared to HHWdown, confirming that it remains more stable against thermal fluctuations. The observed decrease in Td with increasing λ suggests that Z-junctions with larger widths are more susceptible to domain wall depinning due to reduced interaction with pinning sites.
Overall, HHWup consistently requires a higher temperature for depinning than HHWdown, regardless of Z-junction depth or width. Increasing Z-junction depth enhances thermal stability by raising the energy barrier for depinning, while increasing Z-junction width lowers Td, making the domain walls more prone to depinning. These results highlight the significance of structural control in optimizing the thermal stability of domain walls for memory storage applications.

3.3. TTWup and TTWdown Pinning

The micromagnetic simulation was also conducted to investigate the thermal domain wall (DW) pinning and depinning in the Transverse Tail-to-Tail (TTW) configuration through the Z-junction nanowire. The results illustrate the thermal pinning and depinning behavior of Transverse Tail-to-Tail (TTW) up and down domain walls. The micromagnetic snapshots Figure 6a–c represent TTWup, while Figure 6d–f correspond to TTWdown. In both cases, the domain walls interact with the notch, with their evolution influenced by temperature variations. At lower temperatures, the domain walls remain pinned for a longer duration, while at higher temperatures, thermal activation assists in overcoming the pinning barrier, leading to depinning.
The time evolution graphs further highlight these differences. In graph Figure 6g, TTWup shows a significant difference in depinning behavior between 50 K and 100 K, with the domain wall remaining pinned for a longer period at 50 K but depinning rapidly at 100 K. Similarly, in the graph shown in Figure 6h, TTWdown exhibits a delayed depinning response at 100 K, but depinning occurs much faster at 200 K, suggesting that it requires a higher temperature to overcome the pinning potential.
Comparing both configurations, TTWdown exhibits greater thermal stability, as it remains pinned for longer and requires a higher temperature for depinning. In contrast, TTWup is more thermally sensitive, depinning more easily as the temperature increases. These findings indicate that TTWdown could be more suitable for applications requiring greater resistance to thermal fluctuations, whereas TTWup may be more responsive to external thermal activation.
To gain a deeper understanding, further investigations were conducted using different values of the Z-junction depth (d), while keeping the length (λ) fixed. The graphs in Figure 7 illustrate the thermal depinning temperature (Tₐ) as a function of Z-junction depth (d) and length (λ) for up and down Transverse (TTW) domain walls. In Figure 7a, the depinning temperature increases with increasing d for both TTWdown and TTWup. However, TTWup consistently exhibits a higher Td than TTWdown, indicating that it requires more thermal energy to depin. This suggests that increasing d enhances thermal stability, making the domain walls more resistant to thermal depinning due to the stronger pinning effect.
In Figure 7b, the depinning temperature decreases as the domain wall width increases. Wider Z-junction experience weaker pinning effects, making them more susceptible to depinning at lower temperatures. TTWup maintains a higher Td compared to TTWdown, confirming that it remains more stable against thermal fluctuations. The observed decrease in Td with increasing λ suggests that domain walls with larger widths interact less strongly with pinning sites, reducing the energy required for depinning.
Overall, TTWup exhibits greater thermal stability than TTWdown, requiring a higher temperature for depinning across different nanowire thicknesses and domain wall widths. While increasing thickness enhances thermal stability by raising the energy barrier for depinning, increasing the domain wall width lowers Td, making the walls more prone to depinning. These results highlight the significance of structural control in optimizing the thermal stability of domain walls for memory storage applications.

3.4. Magnetic Property Pinning and Depinning

The magnetic properties play a significant role in determining the thermal domain wall (DW) pinning and depinning at the Z-junction. In this study, micromagnetic simulations were conducted to investigate how different magnetic properties influence the thermal behavior of DW pinning and depinning, particularly considering different DW chirality.
Figure 8a,b present the micromagnetic configurations of the head-to-head (HHWup) domain wall with a saturation magnetization of Ms = 800 kA/m. At a device temperature of 100 K, the HHWup remains pinned at the Z-junction, as seen in Figure 8a. However, as the temperature is increased to 200 K, thermal activation provides sufficient energy for the domain wall to overcome the pinning barrier, leading to depinning and propagation toward the end of the nanowire, as shown in Figure 8b.
The time evolution of the x-component of magnetization (mx), shown in Figure 8c, further highlights the impact of temperature on domain wall depinning. At 100 K (black curve), the domain wall remains pinned for a longer duration, exhibiting only minor fluctuations in mx. In contrast, at 200 K (red curve), the domain wall depins rapidly, leading to a sharp increase in mx, indicating full propagation along the nanowire. This behavior confirms that thermal energy significantly influences the depinning process; higher temperatures facilitate domain wall motion by lowering the energy barrier at the Z-junction. These findings emphasize the importance of saturation magnetization and temperature control in optimizing domain wall stability and motion in magnetic nanowires, particularly for memory and logic applications where precise control of DW dynamics is essential.
This study examines the thermal pinning and depinning behavior of a domain wall at a Z-junction for a material with an anisotropy constant of Ku = 0.5 × 105 J/m3. Figure 9a,b display the micromagnetic configurations at different temperatures, while Figure 9c presents the time evolution of the x-component of magnetization (mx).
At a temperature of 100 K, as shown in Figure 9a, the domain wall remains pinned at the Z-junction, indicating that the thermal energy at this temperature is not sufficient to overcome the pinning potential. However, when the temperature is increased to 200 K, as illustrated in Figure 9b, the domain wall exhibits significant thermal fluctuations and depins from the junction, subsequently propagating along the nanowire. This behavior suggests that the increased thermal energy at higher temperatures reduces the effective pinning barrier, thereby facilitating the depinning transition. The time evolution of mx in Figure 9c further confirms this behavior. At 200 K (black curve), the magnetization component increases sharply, indicating a rapid depinning event where the domain wall moves across the junction and stabilizes at the nanowire’s end. In contrast, at 100 K (red curve), the domain wall remains pinned for an extended period, resulting in a lower and more stable mx value over time. This suggests that at higher temperatures, thermal fluctuations contribute to a reduced pinning effect, resulting in a more pronounced depinning response.
These findings highlight the influence of anisotropy on thermal domain wall stability. With Ku = 0.5 × 105 J/m3, domain walls exhibit temperature-dependent pinning behavior, where lower temperatures promote strong pinning, while higher temperatures facilitate depinning.
The graphs illustrate the dependence of the thermal depinning temperature (Td) on the saturation magnetization (Ms) and anisotropy constant (Ku) for head-to-head (HHWup) and HHWdown domain walls at the Z-junction.
In Figure 10a, the depinning temperature increases as the saturation magnetization (Ms) increases for both HHWup and HHWdown configurations. The HHWup domain wall consistently exhibits a higher Td than HHWdown, indicating that it requires more thermal energy to depin. This suggests that increasing Ms enhances the thermal stability of the domain wall by increasing the overall magnetic energy, thereby strengthening the pinning effect at the Z-junction.
In Figure 10b, a similar trend is observed with the anisotropy constant (Ku), where Td increases with increasing Ku. Again, HHWup exhibits a higher depinning temperature than HHWdown, indicating that the up-chirality configuration is more resistant to thermal activation. The increase in Td with Ku suggests that higher anisotropy enhances the domain wall’s stability, making it more resistant to depinning by increasing the energy barrier.
Overall, the results indicate that both Ms and Ku contribute to the thermal stability of the domain wall at the Z-junction. A higher saturation magnetization or anisotropy constant leads to a greater resistance to thermal depinning, with HHWup exhibiting stronger pinning effects than HHWdown in all cases. These findings highlight the importance of material properties in optimizing domain wall stability for applications in memory and logic devices.
Although this study is based on micromagnetic simulations, the observed behaviors of thermally activated domain wall (DW) pinning and chirality-dependent depinning can be experimentally validated using advanced magnetic imaging techniques. Nanowires with tailored Z-junction geometries and controlled magnetic properties can be fabricated using focused electron beam lithography and thin-film deposition methods. These fabrication techniques provide a feasible experimental platform for testing the simulation results presented in this work and for further exploring the design of chirality-engineered, thermally stable spintronic devices. In particular, magneto-optical Kerr effect (MOKE) microscopy can be employed to track domain wall motion under applied current and temperature, enabling real-time visualization of depinning events. Lorentz transmission electron microscopy (TEM) or magnetic force microscopy (MFM) offers high-resolution imaging of magnetic structures and can confirm the influence of Z-junction geometry on DW behavior.

4. Conclusions

This study explored the impact of temperature, chirality, and structural parameters on the pinning and depinning dynamics of transverse domain walls (TDWs) in Z-junction nanowires. The results reveal that thermal activation significantly influences domain wall motion, reducing the pinning energy barrier and enhancing depinning at higher temperatures. The depinning temperature (Td) was found to increase with Z-junction depth, reaching 300 K for d = 50 nm, whereas increasing the domain wall width (λ) weakened the pinning effect, lowering Td to 150 K for λ = 50 nm. Furthermore, domain wall chirality played a crucial role, with HHWup exhibiting stronger pinning and requiring a higher depinning current density of 1.5 × 1011 A/m2, compared to HHWdown, which depinned at 1.2 × 1011 A/m2 at 200 K.
The findings indicate that tuning nanowire geometry and material properties, such as saturation magnetization (Ms = 800 kA/m) and anisotropy constant (Ku = 0.5 × 105 J/m3), can effectively control domain wall stability and motion. The results also highlight that TTW domain walls generally exhibit greater mobility compared to HHW configurations, making them more suitable for applications requiring fast domain wall propagation.
Overall, this work provides critical insights into the thermal behavior of domain walls, which is essential for optimizing spintronic devices and magnetic memory technologies. Future studies could focus on non-uniform geometries, spin–orbit coupling effects, and the influence of stochastic thermal fluctuations on domain wall dynamics to further refine control over nanoscale magnetization processes.

Author Contributions

Methodology, M.A.B.; Software, M.A.B.; Validation, N.A.; Formal analysis, S.A.-K. and N.A.; Investigation, S.A.-K.; Data curation, M.M.A.H.; Writing—original draft, M.A.B.; Writing—review and editing, S.A.-K. and M.M.A.H.; Visualization, M.M.A.H.; Project administration, M.A.B. All authors have read and agreed to the published version of the manuscript.

Funding

This research was funded by the Ministry of Higher Education, Research, and Innovation (MoHERI) of the Sultanate of Oman under the Block Funding Program (Agreement No. BFP/RGP/ICT/23/032).

Data Availability Statement

The original contributions presented in this study are included in the article. Further inquiries can be directed to the corresponding author.

Conflicts of Interest

The authors declare that there are no competing interests.

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Figure 1. Schematic representation of the Z-junction nanowire structure. The nanowire has a total length of L = 300 nm and a width of w = 60 nm. The Z-junction is characterized by two key geometric parameters: the junction depth d and the junction width λ.
Figure 1. Schematic representation of the Z-junction nanowire structure. The nanowire has a total length of L = 300 nm and a width of w = 60 nm. The Z-junction is characterized by two key geometric parameters: the junction depth d and the junction width λ.
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Figure 2. Simulated transverse domain wall (TDW) configurations in a Z-junction magnetic nanowire. (a) Head-to-head wall (HHW) with upward chirality (clockwise magnetization rotation). (b) HHW with downward chirality (counterclockwise rotation). (c) Tail-to-tail wall (TTW) with upward chirality (clockwise rotation). (d) TTW with downward chirality (counterclockwise rotation).
Figure 2. Simulated transverse domain wall (TDW) configurations in a Z-junction magnetic nanowire. (a) Head-to-head wall (HHW) with upward chirality (clockwise magnetization rotation). (b) HHW with downward chirality (counterclockwise rotation). (c) Tail-to-tail wall (TTW) with upward chirality (clockwise rotation). (d) TTW with downward chirality (counterclockwise rotation).
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Figure 3. Domain wall speed as a function of current density (J) for different domain wall configurations at temperatures of 200 K and 300 K. (a) HHWdown, (b) HHWup, (c) TTWdown, and (d) TTWup. The Z-junction device dimensions are λ = 20 nm and d = 40 nm.
Figure 3. Domain wall speed as a function of current density (J) for different domain wall configurations at temperatures of 200 K and 300 K. (a) HHWdown, (b) HHWup, (c) TTWdown, and (d) TTWup. The Z-junction device dimensions are λ = 20 nm and d = 40 nm.
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Figure 4. Snapshots of thermal pinning and depinning of HHWdown (ac) and HHWup (df) domain walls at a Z-junction. (g) Time evolution of mx for HHWdown at 100 K and 200 K, showing gradual depinning. (h) Time evolution of mx for HHWup at 200 K and 250 K, indicating stronger pinning and sharper depinning at higher temperatures. The Z-junction device dimensions are λ = 20 nm and d = 40 nm.
Figure 4. Snapshots of thermal pinning and depinning of HHWdown (ac) and HHWup (df) domain walls at a Z-junction. (g) Time evolution of mx for HHWdown at 100 K and 200 K, showing gradual depinning. (h) Time evolution of mx for HHWup at 200 K and 250 K, indicating stronger pinning and sharper depinning at higher temperatures. The Z-junction device dimensions are λ = 20 nm and d = 40 nm.
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Figure 5. Depinning temperature (Td) as a function of Z-junction dimensions for HHWdown and HHWup domain walls. (a) Td increases with increasing Z-junction depth (d), indicating enhanced thermal stability for deeper junctions. HHWup consistently exhibits a higher depinning temperature than HHWdown, requiring more thermal energy for depinning. (b) Td decreases as the domain wall width (λ) increases, showing that wider Z-junctions reduce pinning effects. HHWup remains more thermally stable than HHWdown across all widths, confirming its stronger resistance to thermal activation.
Figure 5. Depinning temperature (Td) as a function of Z-junction dimensions for HHWdown and HHWup domain walls. (a) Td increases with increasing Z-junction depth (d), indicating enhanced thermal stability for deeper junctions. HHWup consistently exhibits a higher depinning temperature than HHWdown, requiring more thermal energy for depinning. (b) Td decreases as the domain wall width (λ) increases, showing that wider Z-junctions reduce pinning effects. HHWup remains more thermally stable than HHWdown across all widths, confirming its stronger resistance to thermal activation.
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Figure 6. Snapshots and magnetization evolution of thermal pinning and depinning of TTWdown (ac) and TTWup (df) domain walls at a Z-junction under different temperature conditions. (g) Time evolution of the magnetization component mx for TTWdown at 50 K and 100 K, showing a faster depinning process at higher temperatures. (h) Time evolution of mx for TTWup at 100 K and 200 K, indicating a similar trend where higher temperatures facilitate depinning. The results demonstrate that increasing temperature reduces the pinning effect, allowing for more efficient domain wall propagation.
Figure 6. Snapshots and magnetization evolution of thermal pinning and depinning of TTWdown (ac) and TTWup (df) domain walls at a Z-junction under different temperature conditions. (g) Time evolution of the magnetization component mx for TTWdown at 50 K and 100 K, showing a faster depinning process at higher temperatures. (h) Time evolution of mx for TTWup at 100 K and 200 K, indicating a similar trend where higher temperatures facilitate depinning. The results demonstrate that increasing temperature reduces the pinning effect, allowing for more efficient domain wall propagation.
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Figure 7. Depinning temperature (Td) as a function of Z-junction dimensions for TTWdown and TTWup domain walls. (a) Td increases with increasing Z-junction depth (d), indicating enhanced thermal stability for deeper junctions. TTWup consistently exhibits a higher depinning temperature than TTWdown, requiring more thermal energy for depinning. (b) Td decreases as the domain wall width (λ) increases, showing that wider Z-junctions reduce pinning effects. TTWup remains more thermally stable than TTWdown across all widths, confirming its stronger resistance to thermal activation.
Figure 7. Depinning temperature (Td) as a function of Z-junction dimensions for TTWdown and TTWup domain walls. (a) Td increases with increasing Z-junction depth (d), indicating enhanced thermal stability for deeper junctions. TTWup consistently exhibits a higher depinning temperature than TTWdown, requiring more thermal energy for depinning. (b) Td decreases as the domain wall width (λ) increases, showing that wider Z-junctions reduce pinning effects. TTWup remains more thermally stable than TTWdown across all widths, confirming its stronger resistance to thermal activation.
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Figure 8. Snapshots and magnetization evolution of thermal pinning and depinning of the HHWup domain wall at a Z-junction for Ms = 800 kA/m. (a) The HHWup domain wall remains pinned at 100 K, indicating strong thermal stability. (b) At 200 K, thermal activation facilitates depinning, allowing the domain wall to propagate. (c) Time evolution of the magnetization component mx at 100 K (black curve) and 200 K (red curve), showing a faster depinning process at higher temperatures, confirming the effect of thermal energy in overcoming the pinning barrier.
Figure 8. Snapshots and magnetization evolution of thermal pinning and depinning of the HHWup domain wall at a Z-junction for Ms = 800 kA/m. (a) The HHWup domain wall remains pinned at 100 K, indicating strong thermal stability. (b) At 200 K, thermal activation facilitates depinning, allowing the domain wall to propagate. (c) Time evolution of the magnetization component mx at 100 K (black curve) and 200 K (red curve), showing a faster depinning process at higher temperatures, confirming the effect of thermal energy in overcoming the pinning barrier.
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Figure 9. Snapshots and magnetization evolution of thermal pinning and depinning of the HHWup domain wall at a Z-junction for Ku = 0.5 × 105 J/m3. (a) At 100 K, the HHWup domain wall remains pinned at the Z-junction, showing strong resistance to thermal activation. (b) At 200 K, the domain wall undergoes depinning, facilitated by increased thermal energy. (c) Time evolution of the magnetization component mx at 200 K (black curve) and 100 K (red curve), demonstrating that at higher temperatures, depinning occurs more gradually, confirming the role of thermal energy in overcoming the pinning barrier.
Figure 9. Snapshots and magnetization evolution of thermal pinning and depinning of the HHWup domain wall at a Z-junction for Ku = 0.5 × 105 J/m3. (a) At 100 K, the HHWup domain wall remains pinned at the Z-junction, showing strong resistance to thermal activation. (b) At 200 K, the domain wall undergoes depinning, facilitated by increased thermal energy. (c) Time evolution of the magnetization component mx at 200 K (black curve) and 100 K (red curve), demonstrating that at higher temperatures, depinning occurs more gradually, confirming the role of thermal energy in overcoming the pinning barrier.
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Figure 10. Thermal depinning temperature Td as a function of (a) saturation magnetization Ms and (b) uniaxial anisotropy constant Ku for two different domain wall configurations, HHWdown (black squares) and HHWup (red circles).
Figure 10. Thermal depinning temperature Td as a function of (a) saturation magnetization Ms and (b) uniaxial anisotropy constant Ku for two different domain wall configurations, HHWdown (black squares) and HHWup (red circles).
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Al Bahri, M.; Al-Kamiyani, S.; Al Hinaai, M.M.; Ali, N. Thermal Influence on Chirality-Driven Dynamics and Pinning of Transverse Domain Walls in Z-Junction Magnetic Nanowires. Symmetry 2025, 17, 1184. https://doi.org/10.3390/sym17081184

AMA Style

Al Bahri M, Al-Kamiyani S, Al Hinaai MM, Ali N. Thermal Influence on Chirality-Driven Dynamics and Pinning of Transverse Domain Walls in Z-Junction Magnetic Nanowires. Symmetry. 2025; 17(8):1184. https://doi.org/10.3390/sym17081184

Chicago/Turabian Style

Al Bahri, Mohammed, Salim Al-Kamiyani, Mohammed M. Al Hinaai, and Nisar Ali. 2025. "Thermal Influence on Chirality-Driven Dynamics and Pinning of Transverse Domain Walls in Z-Junction Magnetic Nanowires" Symmetry 17, no. 8: 1184. https://doi.org/10.3390/sym17081184

APA Style

Al Bahri, M., Al-Kamiyani, S., Al Hinaai, M. M., & Ali, N. (2025). Thermal Influence on Chirality-Driven Dynamics and Pinning of Transverse Domain Walls in Z-Junction Magnetic Nanowires. Symmetry, 17(8), 1184. https://doi.org/10.3390/sym17081184

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