Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements
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Vazquez Bengochea, L.; Sampurno, Y.; Kavaljer, M.; Johnston, R.; Philipossian, A. Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements. Micromachines 2018, 9, 542. https://doi.org/10.3390/mi9110542
Vazquez Bengochea L, Sampurno Y, Kavaljer M, Johnston R, Philipossian A. Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements. Micromachines. 2018; 9(11):542. https://doi.org/10.3390/mi9110542
Chicago/Turabian StyleVazquez Bengochea, Leticia, Yasa Sampurno, Marcus Kavaljer, Rob Johnston, and Ara Philipossian. 2018. "Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements" Micromachines 9, no. 11: 542. https://doi.org/10.3390/mi9110542
APA StyleVazquez Bengochea, L., Sampurno, Y., Kavaljer, M., Johnston, R., & Philipossian, A. (2018). Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements. Micromachines, 9(11), 542. https://doi.org/10.3390/mi9110542

