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Journal: Micromachines, 2018
Volume: 9
Number: 542

Article: Characterization of CMP Slurries Using Densitometry and Refractive Index Measurements
Authors: by Leticia Vazquez Bengochea, Yasa Sampurno, Marcus Kavaljer, Rob Johnston and Ara Philipossian
Link: https://www.mdpi.com/2072-666X/9/11/542

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