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Volume 13
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10.3390/mi13091454
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Article

A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching

by
Chenying Wang
1,2,
Lei Li
1,2,
Weixuan Jing
2,*,
Yaxin Zhang
2,*,
Song Wang
3,*,
Qijing Lin
1,2,
Dan Xian
1,2,
Qi Mao
2,
Yijun Zhang
4,
Duanzhi Duan
2,
Ming Liu
4 and
Zhuangde Jiang
1,2
1
Collaborative Innovation Center of High-End Manufacturing, Xi’an Jiaotong University, Xi’an 710049, China
2
International Joint Laboratory for Micro/Nano Manufacturing and Measurement Technology, State Key Laboratory for Manufacturing Systems Engineering, Xi’an Jiaotong University, Xi’an 710049, China
3
State Key Laboratory of Robotics and Systems, Harbin Institute of Technology, Harbin 150001, China
4
Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education, International Center for Dielectric Research, School of Electronic Science and Engineering, Xi’an Jiaotong University, Xi’an 710049, China
*
Authors to whom correspondence should be addressed.
Micromachines 2022, 13(9), 1454; https://doi.org/10.3390/mi13091454
Submission received: 2 August 2022 / Revised: 29 August 2022 / Accepted: 30 August 2022 / Published: 2 September 2022
(This article belongs to the Special Issue Advanced Manufacturing Technology and Systems, 2nd Edition)
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Abstract

Nano-steps, as classical nano-geometric reference materials, are very important for calibrating measurements in the semiconductor industry; therefore, controlling the height of nano-steps is critical for ensuring accurate measurements. Accordingly, in this study nano-steps with heights of 1, 2, 3 and 4 nm were fabricated with good morphology using atomic layer deposition (ALD) combined with wet etching. The roughness of the fabricated nano-steps was effectively controlled by utilizing the three-dimensional conformal ALD process. Moreover, the relationship between the surface roughness and the height was studied using a simulation-based analysis. Essentially, roughness control is crucial in fabricating nano-steps with a critical dimension of less than 5 nm. In this study, the minimum height of a nano-step that was successfully achieved by combining ALD and wet etching was 1 nm. Furthermore, the preconditions for quality assurance for a reference material and the influencing factors of the fabrication method were analyzed based on the 1 nm nano-step sample. Finally, the fabricated samples were used in time-dependent experiments to verify the optimal stability of the nano-steps as reference materials. This research is instructive to fabricate nano-geometric reference materials to within 5 nm in height, and the proposed method can be easily employed to manufacture wafer-sized step height reference materials, thus enabling its large-scale industrial application for in-line calibration in integrated circuit production lines.
Keywords: nano-step; atomic layer deposition; step height; roughness nano-step; atomic layer deposition; step height; roughness

Share and Cite

MDPI and ACS Style

Wang, C.; Li, L.; Jing, W.; Zhang, Y.; Wang, S.; Lin, Q.; Xian, D.; Mao, Q.; Zhang, Y.; Duan, D.; et al. A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching. Micromachines 2022, 13, 1454. https://doi.org/10.3390/mi13091454

AMA Style

Wang C, Li L, Jing W, Zhang Y, Wang S, Lin Q, Xian D, Mao Q, Zhang Y, Duan D, et al. A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching. Micromachines. 2022; 13(9):1454. https://doi.org/10.3390/mi13091454

Chicago/Turabian Style

Wang, Chenying, Lei Li, Weixuan Jing, Yaxin Zhang, Song Wang, Qijing Lin, Dan Xian, Qi Mao, Yijun Zhang, Duanzhi Duan, and et al. 2022. "A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching" Micromachines 13, no. 9: 1454. https://doi.org/10.3390/mi13091454

APA Style

Wang, C., Li, L., Jing, W., Zhang, Y., Wang, S., Lin, Q., Xian, D., Mao, Q., Zhang, Y., Duan, D., Liu, M., & Jiang, Z. (2022). A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching. Micromachines, 13(9), 1454. https://doi.org/10.3390/mi13091454

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