Next Article in Journal
Architecture of Computing System based on Chiplet
Next Article in Special Issue
Electrodeposition as a Tool for Nanostructuring Magnetic Materials
Previous Article in Journal
Investigation of the Dynamics of Cavitation Bubbles in a Microfluidic Channel with Actuations
Previous Article in Special Issue
Molecular Recognition by Silicon Nanowire Field-Effect Transistor and Single-Molecule Force Spectroscopy
 
 
Article

Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy

1
Departamento de Física, Universidad de Oviedo, 33007 Oviedo, Spain
2
Centro de Investigación en Nanomateriales y Nanotecnología (CINN), CSIC-Universidad de Oviedo, 33940 El Entrego, Principado de Asturias, Spain
3
ALBA Synchrotron, 08290 Cerdanyola del Vallès, Spain
*
Author to whom correspondence should be addressed.
Academic Editor: Nam-Trung Nguyen
Micromachines 2022, 13(2), 204; https://doi.org/10.3390/mi13020204
Received: 7 January 2022 / Revised: 26 January 2022 / Accepted: 27 January 2022 / Published: 28 January 2022
Patterned elements of permalloy (Py) with a thickness as large as 300 nm have been defined by electron beam lithography on X-ray-transparent 50 nm thick membranes in order to characterize their magnetic structure via Magnetic Transmission X-ray Microscopy (MTXM). To avoid the situation where the fragility of the membranes causes them to break during the lithography process, it has been found that the spin coating of the resist must be applied in two steps. The MTXM results show that our samples have a central domain wall, as well as other types of domain walls, if the nanostructures are wide enough. View Full-Text
Keywords: e-beam lithography; magnetic nanostructures; transmission X-ray microscopy e-beam lithography; magnetic nanostructures; transmission X-ray microscopy
Show Figures

Figure 1

MDPI and ACS Style

Hermosa, J.; Hierro-Rodríguez, A.; Quirós, C.; Vélez, M.; Sorrentino, A.; Aballe, L.; Pereiro, E.; Ferrer, S.; Martín, J.I. Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy. Micromachines 2022, 13, 204. https://doi.org/10.3390/mi13020204

AMA Style

Hermosa J, Hierro-Rodríguez A, Quirós C, Vélez M, Sorrentino A, Aballe L, Pereiro E, Ferrer S, Martín JI. Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy. Micromachines. 2022; 13(2):204. https://doi.org/10.3390/mi13020204

Chicago/Turabian Style

Hermosa, Javier, Aurelio Hierro-Rodríguez, Carlos Quirós, María Vélez, Andrea Sorrentino, Lucía Aballe, Eva Pereiro, Salvador Ferrer, and José I. Martín. 2022. "Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy" Micromachines 13, no. 2: 204. https://doi.org/10.3390/mi13020204

Find Other Styles
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map by Country/Region

1
Back to TopTop