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Journal: Micromachines, 2022
Volume: 13
Number: 204
204
Article: Two-Step Resist Deposition of E-Beam Patterned Thick Py Nanostructures for X-ray Microscopy
Authors: by Javier Hermosa, Aurelio Hierro-Rodríguez, Carlos Quirós, María Vélez, Andrea Sorrentino, Lucía Aballe, Eva Pereiro, Salvador Ferrer and José I. Martín
Link: https://www.mdpi.com/2072-666X/13/2/204

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