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Journal: Micromachines, 2022
Volume: 13
Number: 173
Article:
Deposition of Very-Low-Hydrogen-Containing Silicon at a Low Temperature Using Very-High-Frequency (162 MHz) SiH4 Plasma
Authors:
by
Ki Seok Kim, You-Jin Ji, Ki-Hyun Kim, Ji-Eun Kang, Albert Rogers Ellingboe and Geun Young Yeom
Link:
https://www.mdpi.com/2072-666X/13/2/173
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