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Journal: MicromachinesVolume: 10Number: 446
Article: Effect of Annealing Temperature for Ni/AlOx/Pt RRAM Devices Fabricated with Solution-Based Dielectric
- Authors:
- Zongjie Shen1,2,
- Yanfei Qi1,3 and
- Ivona Z. Mitrovic2
- et al.
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