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Journal: Micromachines, 2019
Volume: 10
Number: 446
446
Article: Effect of Annealing Temperature for Ni/AlO_x/Pt RRAM Devices Fabricated with Solution-Based Dielectric
Authors: by Zongjie Shen, Yanfei Qi, Ivona Z. Mitrovic, Cezhou Zhao, Steve Hall, Li Yang, Tian Luo, Yanbo Huang and Chun Zhao
Link: https://www.mdpi.com/2072-666X/10/7/446

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