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Additive Nano-Lithography with Focused Soft X-rays: Basics, Challenges, and Opportunities

Friedrich-Alexander-University Erlangen-Nuremberg, Physical Chemistry II, Egerlandstraße 3, 91058 Erlangen, Germany
Micromachines 2019, 10(12), 834; https://doi.org/10.3390/mi10120834
Received: 9 November 2019 / Revised: 27 November 2019 / Accepted: 29 November 2019 / Published: 30 November 2019
(This article belongs to the Special Issue Multi-Dimensional Direct-Write Nanofabrication )
Focused soft X-ray beam induced deposition (FXBID) is a novel technique for direct-write nanofabrication of metallic nanostructures from metal organic precursor gases. It combines the established concepts of focused electron beam induced processing (FEBIP) and X-ray lithography (XRL). The present setup is based on a scanning transmission X-ray microscope (STXM) equipped with a gas flow cell to provide metal organic precursor molecules towards the intended deposition zone. Fundamentals of X-ray microscopy instrumentation and X-ray radiation chemistry relevant for FXBID development are presented in a comprehensive form. Recently published proof-of-concept studies on initial experiments on FXBID nanolithography are reviewed for an overview on current progress and proposed advances of nanofabrication performance. Potential applications and advantages of FXBID are discussed with respect to competing electron/ion based techniques. View Full-Text
Keywords: direct-write nanofabrication; additive nanofabrication; X-ray lithography; X-ray microscopy direct-write nanofabrication; additive nanofabrication; X-ray lithography; X-ray microscopy
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Späth, A. Additive Nano-Lithography with Focused Soft X-rays: Basics, Challenges, and Opportunities. Micromachines 2019, 10, 834.

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