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Journal: Micromachines, 2019
Volume: 10
Number: 689

Article: Selective Growth and Contact Gap-Fill of Low Resistivity Si via Microwave Plasma-Enhanced CVD
Authors: by Youngwan Kim, Myoungwoo Lee and Youn-Jea Kim
Link: https://www.mdpi.com/2072-666X/10/10/689

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