Kluska, S.; Jurzecka-Szymacha, M.; Nosidlak, N.; Dulian, P.; Jaglarz, J.
The Optical and Thermo-Optical Properties of Non-Stoichiometric Silicon Nitride Layers Obtained by the PECVD Method with Varying Levels of Nitrogen Content. Materials 2022, 15, 2260.
https://doi.org/10.3390/ma15062260
AMA Style
Kluska S, Jurzecka-Szymacha M, Nosidlak N, Dulian P, Jaglarz J.
The Optical and Thermo-Optical Properties of Non-Stoichiometric Silicon Nitride Layers Obtained by the PECVD Method with Varying Levels of Nitrogen Content. Materials. 2022; 15(6):2260.
https://doi.org/10.3390/ma15062260
Chicago/Turabian Style
Kluska, Stanisława, Maria Jurzecka-Szymacha, Natalia Nosidlak, Piotr Dulian, and Janusz Jaglarz.
2022. "The Optical and Thermo-Optical Properties of Non-Stoichiometric Silicon Nitride Layers Obtained by the PECVD Method with Varying Levels of Nitrogen Content" Materials 15, no. 6: 2260.
https://doi.org/10.3390/ma15062260
APA Style
Kluska, S., Jurzecka-Szymacha, M., Nosidlak, N., Dulian, P., & Jaglarz, J.
(2022). The Optical and Thermo-Optical Properties of Non-Stoichiometric Silicon Nitride Layers Obtained by the PECVD Method with Varying Levels of Nitrogen Content. Materials, 15(6), 2260.
https://doi.org/10.3390/ma15062260