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Journal: MaterialsVolume: 15Number: 6285
Article: Charge Storage and Reliability Characteristics of Nonvolatile Memory Capacitors with HfO2/Al2O3-Based Charge Trapping Layers
- Authors:
- Dencho Spassov1,
- Albena Paskaleva1,* and
- Elżbieta Guziewicz2
- et al.
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