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Keywords = silicone-based dry sensors

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19 pages, 8894 KB  
Article
The Effect of Doping rGO with Nanosized MnO2 on Its Gas Sensing Properties
by Mohamed Ayoub Alouani, Juan Casanova-Chafer, Santiago de Bernardi-Martín, Alejandra García-Gómez, Foad Salehnia, José Carlos Santos-Ceballos, Alejandro Santos-Betancourt, Xavier Vilanova and Eduard Llobet
Chemosensors 2024, 12(12), 256; https://doi.org/10.3390/chemosensors12120256 - 6 Dec 2024
Cited by 5 | Viewed by 2119
Abstract
Manganese dioxide (MnO2) has drawn attention as a sensitiser to be incorporated in graphene-based chemoresistive sensors thanks to its promising properties. In this regard, a rGO@MnO2 sensing material was prepared and deposited on two different substrates (silicon and Kapton). The [...] Read more.
Manganese dioxide (MnO2) has drawn attention as a sensitiser to be incorporated in graphene-based chemoresistive sensors thanks to its promising properties. In this regard, a rGO@MnO2 sensing material was prepared and deposited on two different substrates (silicon and Kapton). The effect of the substrate nature on the morphology and sensing behaviour of the rGO@MnO2 material was thoroughly analysed and reported. These sensors were exposed to different dilutions of NO2 ranging from 200 ppb to 1000 ppb under dry and humid conditions (25% RH and 70% RH) at room temperature. rGO@MnO2 deposited on Kapton showed the highest response of 6.6% towards 1 ppm of NO2 under dry conditions at RT. Other gases or vapours such as NH3, CO, ethanol, H2 and benzene were also tested. FESEM, HRTEM, Raman, XRD and ATR-IR were used to characterise the prepared sensors. The experimental results showed that the incorporation of nanosized MnO2 in the rGO material enhanced its response towards NO2. Moreover, this material also showed very good responses toward NH3 both under dry and humid conditions, with the rGO@MnO2 sensor on silicon showing the highest response of 18.5% towards 50 ppm of NH3 under 50% RH at RT. Finally, the synthetised layers showed no cross-responsiveness towards other toxic gases. Full article
(This article belongs to the Special Issue Advanced Chemical Sensors for Gas Detection)
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18 pages, 9237 KB  
Article
Highly Photoresponsive Vertically Stacked Silicon Nanowire Photodetector with Biphasic Current Stimulator IC for Retinal Prostheses
by Taehwan Kim, Seungju Han and Sangmin Lee
Appl. Sci. 2024, 14(19), 8831; https://doi.org/10.3390/app14198831 - 1 Oct 2024
Viewed by 4305
Abstract
This paper presents an integrated approach for a retinal prosthesis that overcomes the scalability challenges and limitations of conventional systems that use external cameras. Silicon nanowires (SiNWs) are utilized as photonic sensors due to their nanoscale dimensions and high surface-to-volume ratio. To enhance [...] Read more.
This paper presents an integrated approach for a retinal prosthesis that overcomes the scalability challenges and limitations of conventional systems that use external cameras. Silicon nanowires (SiNWs) are utilized as photonic sensors due to their nanoscale dimensions and high surface-to-volume ratio. To enhance these properties and achieve high photoresponsivity, our research team developed a vertically stacked SiNW structure using a fabrication method entirely based on dry etching. The fabricated SiNW photodetector demonstrated excellent electrical and optical characteristics, including linear I–V characteristics that confirmed ohmic contact formation and high photoresponsivity exceeding 105 A/W across the 400–800 nm wavelength range. The SiNW photodetector, following its integration with a switched capacitor stimulator circuit, exhibited a proportional increase in stimulation current in response to higher light intensity and increased SiNW density. In vitro experiments confirmed the efficacy of the integrated system in inducing neural responses from retinal cells, as indicated by an increased number of neural spikes observed at higher light intensities and SiNW densities. This study contributes to sensor technology by demonstrating an approach to integrating nanostructures and electronic components, which enhances control and functionality. Full article
(This article belongs to the Special Issue Recent Progress and Challenges of Digital Health and Bioengineering)
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15 pages, 13225 KB  
Article
Application of p and n-Type Silicon Nanowires as Human Respiratory Sensing Device
by Elham Fakhri, Muhammad Taha Sultan, Andrei Manolescu, Snorri Ingvarsson and Halldor Gudfinnur Svavarsson
Sensors 2023, 23(24), 9901; https://doi.org/10.3390/s23249901 - 18 Dec 2023
Cited by 11 | Viewed by 2434
Abstract
Accurate and fast breath monitoring is of great importance for various healthcare applications, for example, medical diagnoses, studying sleep apnea, and early detection of physiological disorders. Devices meant for such applications tend to be uncomfortable for the subject (patient) and pricey. Therefore, there [...] Read more.
Accurate and fast breath monitoring is of great importance for various healthcare applications, for example, medical diagnoses, studying sleep apnea, and early detection of physiological disorders. Devices meant for such applications tend to be uncomfortable for the subject (patient) and pricey. Therefore, there is a need for a cost-effective, lightweight, small-dimensional, and non-invasive device whose presence does not interfere with the observed signals. This paper reports on the fabrication of a highly sensitive human respiratory sensor based on silicon nanowires (SiNWs) fabricated by a top-down method of metal-assisted chemical-etching (MACE). Besides other important factors, reducing the final cost of the sensor is of paramount importance. One of the factors that increases the final price of the sensors is using gold (Au) electrodes. Herein, we investigate the sensor’s response using aluminum (Al) electrodes as a cost-effective alternative, considering the fact that the electrode’s work function is crucial in electronic device design, impacting device electronic properties and electron transport efficiency at the electrode–semiconductor interface. Therefore a comparison is made between SiNWs breath sensors made from both p-type and n-type silicon to investigate the effect of the dopant and electrode type on the SiNWs respiratory sensing functionality. A distinct directional variation was observed in the sample’s response with Au and Al electrodes. Finally, performing a qualitative study revealed that the electrical resistance across the SiNWs renders greater sensitivity to breath than to dry air pressure. No definitive research demonstrating the mechanism behind these effects exists, thus prompting our study to investigate the underlying process. Full article
(This article belongs to the Special Issue Nanomaterials for Sensor Applications)
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11 pages, 6329 KB  
Article
A Single-Side Micromachined MPa-Scale High-Temperature Pressure Sensor
by Peng Li, Wei Li, Changnan Chen, Sheng Wu, Pichao Pan, Ke Sun, Min Liu, Jiachou Wang and Xinxin Li
Micromachines 2023, 14(5), 981; https://doi.org/10.3390/mi14050981 - 29 Apr 2023
Cited by 4 | Viewed by 2969
Abstract
This paper proposes a piezoresistive high-temperature absolute pressure sensor based on (100)/(111) hybrid SOI (silicon-on-insulator) silicon wafers, where the active layer is (100) silicon and the handle layer is (111) silicon. The 1.5 MPa ranged sensor chips are designed with the size as [...] Read more.
This paper proposes a piezoresistive high-temperature absolute pressure sensor based on (100)/(111) hybrid SOI (silicon-on-insulator) silicon wafers, where the active layer is (100) silicon and the handle layer is (111) silicon. The 1.5 MPa ranged sensor chips are designed with the size as tiny as 0.5 × 0.5 mm, and the chips are fabricated only from the front side of the wafer for simple, high-yield and low-cost batch production. Herein, the (100) active layer is specifically used to form high-performance piezoresistors for high-temperature pressure sensing, while the (111) handle layer is used to single-side construct the pressure-sensing diaphragm and the pressure-reference cavity beneath the diaphragm. Benefitting from front-sided shallow dry etching and self-stop lateral wet etching inside the (111)-silicon substrate, the thickness of the pressure-sensing diaphragm is uniform and controllable, and the pressure-reference cavity is embedded into the handle layer of (111) silicon. Without the conventionally used double-sided etching, wafer bonding and cavity-SOI manufacturing, a very small sensor chip size of 0.5 × 0.5 mm is achieved. The measured performance of the 1.5 MPa ranged pressure sensor exhibits a full-scale output of approximately 59.55 mV/1500 kPa/3.3 VDC in room temperature and a high overall accuracy (combined with hysteresis, non-linearity and repeatability) of 0.17%FS within the temperature range of −55 °C to 350 °C. In addition, the thermal hysteresis is also evaluated as approximately 0.15%FS at 350 °C. The tiny-sized high temperature pressure sensors are promising in various industrial automatic control applications and wind tunnel testing systems. Full article
(This article belongs to the Topic MEMS Sensors and Resonators)
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13 pages, 3645 KB  
Article
Highly Sensitive Capacitive MEMS for Photoacoustic Gas Trace Detection
by Tarek Seoudi, Julien Charensol, Wioletta Trzpil, Fanny Pages, Diba Ayache, Roman Rousseau, Aurore Vicet and Michael Bahriz
Sensors 2023, 23(6), 3280; https://doi.org/10.3390/s23063280 - 20 Mar 2023
Cited by 7 | Viewed by 3677
Abstract
An enhanced MEMS capacitive sensor is developed for photoacoustic gas detection. This work attempts to address the lack of the literature regarding integrated and compact silicon-based photoacoustic gas sensors. The proposed mechanical resonator combines the advantages of silicon technology used in MEMS microphones [...] Read more.
An enhanced MEMS capacitive sensor is developed for photoacoustic gas detection. This work attempts to address the lack of the literature regarding integrated and compact silicon-based photoacoustic gas sensors. The proposed mechanical resonator combines the advantages of silicon technology used in MEMS microphones and the high-quality factor, characteristic of quartz tuning fork (QTF). The suggested design focuses on a functional partitioning of the structure to simultaneously enhance the collection of the photoacoustic energy, overcome viscous damping, and provide high nominal capacitance. The sensor is modeled and fabricated using silicon-on-insulator (SOI) wafers. First, an electrical characterization is performed to evaluate the resonator frequency response and nominal capacitance. Then, under photoacoustic excitation and without using an acoustic cavity, the viability and the linearity of the sensor are demonstrated by performing measurements on calibrated concentrations of methane in dry nitrogen. In the first harmonic detection, the limit of detection (LOD) is 104 ppmv (for 1 s integration time), leading to a normalized noise equivalent absorption coefficient (NNEA) of 8.6 ⋅ 10−8 Wcm−1 Hz−1/2, which is better than that of bare Quartz-Enhanced Photoacoustic Spectroscopy (QEPAS), a state-of-the-art reference to compact and selective gas sensors. Full article
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12 pages, 12511 KB  
Article
Highly Sensitive and Selective Sodium Ion Sensor Based on Silicon Nanowire Dual Gate Field-Effect Transistor
by Seong-Kun Cho and Won-Ju Cho
Sensors 2021, 21(12), 4213; https://doi.org/10.3390/s21124213 - 19 Jun 2021
Cited by 16 | Viewed by 5233
Abstract
In this study, a highly sensitive and selective sodium ion sensor consisting of a dual-gate (DG) structured silicon nanowire (SiNW) field-effect transistor (FET) as the transducer and a sodium-selective membrane extended gate (EG) as the sensing unit was developed. The SiNW channel DG [...] Read more.
In this study, a highly sensitive and selective sodium ion sensor consisting of a dual-gate (DG) structured silicon nanowire (SiNW) field-effect transistor (FET) as the transducer and a sodium-selective membrane extended gate (EG) as the sensing unit was developed. The SiNW channel DG FET was fabricated through the dry etching of the silicon-on-insulator substrate by using electrospun polyvinylpyrrolidone nanofibers as a template for the SiNW pattern transfer. The selectivity and sensitivity of sodium to other ions were verified by constructing a sodium ion sensor, wherein the EG was electrically connected to the SiNW channel DG FET with a sodium-selective membrane. An extremely high sensitivity of 1464.66 mV/dec was obtained for a NaCl solution. The low sensitivities of the SiNW channel FET-based sodium ion sensor to CaCl2, KCl, and pH buffer solutions demonstrated its excellent selectivity. The reliability and stability of the sodium ion sensor were verified under non-ideal behaviors by analyzing the hysteresis and drift. Therefore, the SiNW channel DG FET-based sodium ion sensor, which comprises a sodium-selective membrane EG, can be applied to accurately detect sodium ions in the analyses of sweat or blood. Full article
(This article belongs to the Special Issue Chemical Sensors for Measurement Systems)
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3 pages, 377 KB  
Proceeding Paper
Temperature Cycled Operation and Multivariate Statistics for Electronic-Nose Applications Using Field Effect Transistors
by Guillem Domènech-Gil, Marius Rodner, Jens Eriksson and Donatella Puglisi
Proceedings 2020, 56(1), 37; https://doi.org/10.3390/proceedings2020056037 - 31 Dec 2020
Viewed by 1529
Abstract
Gas sensitive iridium-gated field effect transistors based on silicon carbide were used to study the response towards formaldehyde, ammonia, carbon monoxide and nitrogen dioxide at concentrations ranging from parts per million to parts per billion diluted in dry synthetic air and under 50% [...] Read more.
Gas sensitive iridium-gated field effect transistors based on silicon carbide were used to study the response towards formaldehyde, ammonia, carbon monoxide and nitrogen dioxide at concentrations ranging from parts per million to parts per billion diluted in dry synthetic air and under 50% of relative humidity. The sensor performance was studied using temperature cycled operation mode from 270 to 390 °C to investigate the capability of these devices to discriminate between the studied gases under different background conditions via pattern recognition algorithms. Full article
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16 pages, 2953 KB  
Proceeding Paper
Highly Sensitive H2S Sensing with Gold and Platinum Surface-Modified ZnO Nanowire ChemFETs
by Angelika Kaiser, Erick Torres Ceja, Florian Huber, Ulrich Herr and Klaus Thonke
Proceedings 2020, 60(1), 7; https://doi.org/10.3390/IECB2020-07070 - 2 Nov 2020
Cited by 7 | Viewed by 1952
Abstract
In this work, we investigate the catalytic effects of gold (Au) and platinum (Pt) nanoparticle layer deposition on highly sensitive zinc oxide (ZnO) nanowires (NWs) used for selective H2S detection in the sub-ppm region. Optimum quality pristine ZnO NWs were grown [...] Read more.
In this work, we investigate the catalytic effects of gold (Au) and platinum (Pt) nanoparticle layer deposition on highly sensitive zinc oxide (ZnO) nanowires (NWs) used for selective H2S detection in the sub-ppm region. Optimum quality pristine ZnO NWs were grown by high temperature chemical vapor deposition (CVD) in the vapor liquid solid growth (VLS) mode on silicon with a thin Au layer acting as a growth catalyst. The surface of pristine ZnO NWs was modified by systematic magnetron sputtering of discontinuous Au and Pt layers of 0–5 nm thickness. Resistive gas sensors based on the gas sensing mechanism of a chemical field effect transistor (ChemFET) with open gate, which is formed by hundreds of parallel aligned pristine Au-modified or Pt-modified ZnO NWs, were measured toward H2S diluted in dry nitrogen (N2) or in dry synthetic air at room temperature. Gas sensing results showed a largely improved response due to the catalytic effects of metal deposition on the ZnO NW surface. Controlled application of ZnO NW growth under optimized conditions and metal catalyst deposition showed a clear response enhancement toward 1 ppm H2S from the initial 20% achieved with pristine ZnO to over 5000% with ZnO NWs covered by 5 nm of Au, and, hence, significantly lower than the limit of detection. Full article
(This article belongs to the Proceedings of The 1st International Electronic Conference on Biosensors)
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23 pages, 7556 KB  
Review
Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review
by Lucia Romano and Marco Stampanoni
Micromachines 2020, 11(6), 589; https://doi.org/10.3390/mi11060589 - 12 Jun 2020
Cited by 46 | Viewed by 8099
Abstract
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X-ray optics. Microfabrication is usually achieved by dry-etch with reactive ions and KOH based wet-etch, metal assisted [...] Read more.
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X-ray optics. Microfabrication is usually achieved by dry-etch with reactive ions and KOH based wet-etch, metal assisted chemical etching (MacEtch) is emerging as a new etching technique that allows huge aspect ratio for feature size in the nanoscale. To date, a specialized review of MacEtch that considers both the fundamentals and X-ray optics applications is missing in the literature. This review aims to provide a comprehensive summary including: (i) fundamental mechanism; (ii) basics and roles to perform uniform etching in direction perpendicular to the <100> Si substrate; (iii) several examples of X-ray optics fabricated by MacEtch such as line gratings, circular gratings array, Fresnel zone plates, and other X-ray lenses; (iv) materials and methods for a full fabrication of absorbing gratings and the application in X-ray grating based interferometry; and (v) future perspectives of X-ray optics fabrication. The review provides researchers and engineers with an extensive and updated understanding of the principles and applications of MacEtch as a new technology for X-ray optics fabrication. Full article
(This article belongs to the Special Issue Micro- and Nano-Fabrication by Metal Assisted Chemical Etching)
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19 pages, 6608 KB  
Article
A Novel Micromachined Z-axis Torsional Accelerometer Based on the Tunneling Magnetoresistive Effect
by Bo Yang, Xiaoyong Gao and Cheng Li
Micromachines 2020, 11(4), 422; https://doi.org/10.3390/mi11040422 - 17 Apr 2020
Cited by 9 | Viewed by 3338
Abstract
A novel micromachined z-axis torsional accelerometer based on the tunneling magnetoresistive effect is presented in this paper. The plane main structure bonded with permanent magnetic film is driven to twist under the action of inertial acceleration, which results in the opposite variation of [...] Read more.
A novel micromachined z-axis torsional accelerometer based on the tunneling magnetoresistive effect is presented in this paper. The plane main structure bonded with permanent magnetic film is driven to twist under the action of inertial acceleration, which results in the opposite variation of the magnetic field intensity. The variation of the magnetic field is measured by two differential tunneling magnetoresistive sensors arranged on the top substrate respectively. Electrostatic feedback electrodes plated on the bottom substrate are used to revert the plane main structure to an equilibrium state and realize the closed-loop detection of acceleration. A modal simulation of the micromachined z-axis tunneling magnetoresistive accelerometer was implemented to verify the theoretical formula and the structural optimization. Simultaneously, the characteristics of the magnetic field were analyzed to optimize the layout of the tunneling magnetoresistance accelerometer by finite element simulation. The plane main structure, fabricated with the process of standard deep dry silicon on glass (DDSOG), had dimensions of 8000 μm (length) × 8000 μm (width) × 120μm (height). A prototype of the micromachined z-axis tunneling magnetoresistive accelerometer was produced by micro-assembly of the plane main structure with the tunneling magnetoresistive sensors. The experiment results demonstrate that the prototype has a maximal sensitivity of 1.7 mV/g and an acceleration resolution of 128 μg/Hz0.5 along the z-axis sensitive direction. Full article
(This article belongs to the Section A:Physics)
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11 pages, 4647 KB  
Article
Research on a Micro-Processing Technology for Fabricating Complex Structures in Single-Crystal Quartz
by Chao Han, Cun Li, Yulong Zhao, Bo Li and Xueyong Wei
Micromachines 2020, 11(3), 337; https://doi.org/10.3390/mi11030337 - 24 Mar 2020
Cited by 11 | Viewed by 4906
Abstract
Single-crystal quartz material is widely applied in the manufacture of resonators and sensors, but it is difficult to process because of its high hardness. A novel way to fabricate single-crystal quartz structures is proposed in this paper; the method includes quartz-on-silicon (QoS) technology [...] Read more.
Single-crystal quartz material is widely applied in the manufacture of resonators and sensors, but it is difficult to process because of its high hardness. A novel way to fabricate single-crystal quartz structures is proposed in this paper; the method includes quartz-on-silicon (QoS) technology and inductively coupled plasma (ICP) etching, which makes it feasible to fabricate complex structures with crystal quartz. The QoS method encompasses the bonding of silicon and quartz, followed by the thinning and polishing of quartz, which can enable the fabrication of an ultra-thin quartz wafer on silicon. In this way, instead of the conventional wet etching with hydrofluoric acid, the quartz layer can be easily etched using the ICP dry-etching method. Then, the structure of the pure quartz material is obtained by removing the silicon wafer. In addition, the silicon layer can be processed into the appropriate structure. This aspect overcomes the difficulty of processing a complex structure of single-crystal quartz with different crystal orientations. Thin single-crystal quartz wafers of Z-cut with a thickness of less than 40 μm were obtained by using this method, and a complex three-dimensional structure with an 80 μm width was also acquired by the ICP etching of the quartz wafer. The method can be applied to make both crystal-oriented quartz-based sensors and actuators, such as quartz resonant accelerometers. Full article
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6 pages, 443 KB  
Proceeding Paper
Zeolite-Based Fast-Responding Sensors for Respiratory Rate Monitoring
by Gianfranco Carotenuto and Carlo Camerlingo
Proceedings 2020, 42(1), 9; https://doi.org/10.3390/ecsa-6-06628 - 14 Nov 2019
Cited by 2 | Viewed by 1556
Abstract
Wearable electrical sensors based on zeolites can be used for breath monitoring. The high silicon content of clinoptilolite makes this type of zeolite very adequate for fabricating sensitive water sensors. In addition to sensitivity, response fastness also represents a sensor characteristic of fundamental [...] Read more.
Wearable electrical sensors based on zeolites can be used for breath monitoring. The high silicon content of clinoptilolite makes this type of zeolite very adequate for fabricating sensitive water sensors. In addition to sensitivity, response fastness also represents a sensor characteristic of fundamental importance for breath monitoring. Here, the response fastness of a clinoptilolite-based water sensor has been evaluated by measuring the current intensity behavior upon exposition to a constant humidity atmosphere (75%). In particular, the clinoptilolite surface has been biased with a sinusoidal signal (20 Vpp, 5 kHz), and the true-RMS current intensity value has been recorded during exposition to the constant humidity atmosphere. Since current intensity is proportional to the adsorbed water concentration (only hydrated cations are charge carriers) a kinetic analysis has been possible. The clinoptilolite dehydration kinetics in a dry atmosphere have been evaluated too. According to this kinetic analysis, water adsorption is described by a Lagergren pseudo-first-order model with a rate constant of (58.6 ± 0.9)·10−4 min−1, while desorption in dry air follows a first-order kinetic model with a specific rate of (202.7 ± 0.3)·10−4 min−1 at 25 °C. Full article
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11 pages, 4277 KB  
Article
Tensile Strength of Silicon Nanowires Batch-Fabricated into Electrostatic MEMS Testing Device
by Toshiyuki Tsuchiya, Tetsuya Hemmi, Jun-ya Suzuki, Yoshikazu Hirai and Osamu Tabata
Appl. Sci. 2018, 8(6), 880; https://doi.org/10.3390/app8060880 - 28 May 2018
Cited by 22 | Viewed by 6555
Abstract
The tensile strength of a silicon nanowire (SiNW) that had been integrated into a silicon-on-insulator (SOI)-based microelectromechanical system (MEMS) device was measured using electrostatic actuation and sensing. SiNWs of about 150 nm diameter and 5 μm length were batch-fabricated into a 5-μm-thick SOI [...] Read more.
The tensile strength of a silicon nanowire (SiNW) that had been integrated into a silicon-on-insulator (SOI)-based microelectromechanical system (MEMS) device was measured using electrostatic actuation and sensing. SiNWs of about 150 nm diameter and 5 μm length were batch-fabricated into a 5-μm-thick SOI device layer. Since there was no interface between the SiNW and the MEMS device and the alignment was perfect, the SiNW integration into an SOI-MEMS was expected to be useful for developing highly sensitive biochemical sensors or highly reliable torsional mirror devices. The SiNW was tensile tested using the electrostatic MEMS testing device. The integration was achieved using a combination of anisotropic and an isotropic dry etching of silicon, with an inductively coupled plasma reactive ion etching. A fabricated silicon beam of 800 nm square was thinned by a sacrificial oxidation process. The tensile strength of the wire was 2.6–4.1 GPa, which was comparable to that of microscale silicon MEMS structures. The reliability of such a thin device was successfully verified for future applications of the device structures. Full article
(This article belongs to the Special Issue Silicon Nanowires and Their Applications)
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17 pages, 5935 KB  
Article
New Flexible Silicone-Based EEG Dry Sensor Material Compositions Exhibiting Improvements in Lifespan, Conductivity, and Reliability
by Yi-Hsin Yu, Shih-Hsun Chen, Che-Lun Chang, Chin-Teng Lin, W. David Hairston and Randy A. Mrozek
Sensors 2016, 16(11), 1826; https://doi.org/10.3390/s16111826 - 31 Oct 2016
Cited by 27 | Viewed by 7805
Abstract
This study investigates alternative material compositions for flexible silicone-based dry electroencephalography (EEG) electrodes to improve the performance lifespan while maintaining high-fidelity transmission of EEG signals. Electrode materials were fabricated with varying concentrations of silver-coated silica and silver flakes to evaluate their electrical, mechanical, [...] Read more.
This study investigates alternative material compositions for flexible silicone-based dry electroencephalography (EEG) electrodes to improve the performance lifespan while maintaining high-fidelity transmission of EEG signals. Electrode materials were fabricated with varying concentrations of silver-coated silica and silver flakes to evaluate their electrical, mechanical, and EEG transmission performance. Scanning electron microscope (SEM) analysis of the initial electrode development identified some weak points in the sensors’ construction, including particle pull-out and ablation of the silver coating on the silica filler. The newly-developed sensor materials achieved significant improvement in EEG measurements while maintaining the advantages of previous silicone-based electrodes, including flexibility and non-toxicity. The experimental results indicated that the proposed electrodes maintained suitable performance even after exposure to temperature fluctuations, 85% relative humidity, and enhanced corrosion conditions demonstrating improvements in the environmental stability. Fabricated flat (forehead) and acicular (hairy sites) electrodes composed of the optimum identified formulation exhibited low impedance and reliable EEG measurement; some initial human experiments demonstrate the feasibility of using these silicone-based electrodes for typical lab data collection applications. Full article
(This article belongs to the Section Biosensors)
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11 pages, 6502 KB  
Article
Laterally Driven Resonant Pressure Sensor with Etched Silicon Dual Diaphragms and Combined Beams
by Xiaohui Du, Yifang Liu, Anlin Li, Zhou Zhou, Daoheng Sun and Lingyun Wang
Sensors 2016, 16(2), 158; https://doi.org/10.3390/s16020158 - 26 Jan 2016
Cited by 20 | Viewed by 9534
Abstract
A novel structure of the resonant pressure sensor is presented in this paper, which tactfully employs intercoupling between dual pressure-sensing diaphragms and a laterally driven resonant strain gauge. After the resonant pressure sensor principle is introduced, the coupling mechanism of the diaphragms and [...] Read more.
A novel structure of the resonant pressure sensor is presented in this paper, which tactfully employs intercoupling between dual pressure-sensing diaphragms and a laterally driven resonant strain gauge. After the resonant pressure sensor principle is introduced, the coupling mechanism of the diaphragms and resonator is analyzed and the frequency equation of the resonator based on the triangle geometry theory is developed for this new coupling structure. The finite element (FE) simulation results match the theoretical analysis over the full scale of the device. This pressure sensor was first fabricated by dry/wet etching and thermal silicon bonding, followed by vacuum-packaging using anodic bonding technology. The test maximum error of the fabricated sensor is 0.0310%F.S. (full scale) in the range of 30 to 190 kPa, its pressure sensitivity is negative and exceeding 8 Hz/kPa, and its Q-factor reaches 20,000 after wafer vacuum-packaging. A novel resonant pressure sensor with high accuracy is presented in this paper. Full article
(This article belongs to the Section Physical Sensors)
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